2021
DOI: 10.1021/acsapm.1c00381
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The Effect of Ultraviolet Light on Biorepulsive Hydrogel Poly(ethylene glycol) Films

Abstract: We studied the effect of ultraviolet (UV) light (254 nm) on porous poly(ethylene glycol) (PEG) films, formed by cross-linking of the epoxide-and amino-terminated four-arm STAR-PEG compounds. The major effect of irradiation is progressive decomposition of the PEG material followed by immediate desorption of the released fragments. The removal of the PEG material can be coarsely described by zero-order kinetics with a rate constant of 0.32 ± 0.05 nm/(J/cm 2 ). Surprisingly, this process does not affect the chemi… Show more

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Cited by 10 publications
(20 citation statements)
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References 61 publications
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“…In contrast to electron irradiation, the exposure of the PEG films to UV light does not result in their modification but only in a partial loss of material [ 18 ]. However, the mechanism behind the respective decomposition of the PEG network, which follows zero-order kinetics [ 18 ], is still unclear.…”
Section: Resultsmentioning
confidence: 99%
See 4 more Smart Citations
“…In contrast to electron irradiation, the exposure of the PEG films to UV light does not result in their modification but only in a partial loss of material [ 18 ]. However, the mechanism behind the respective decomposition of the PEG network, which follows zero-order kinetics [ 18 ], is still unclear.…”
Section: Resultsmentioning
confidence: 99%
“…In contrast to electron irradiation, the exposure of the PEG films to UV light does not result in their modification but only in a partial loss of material [ 18 ]. However, the mechanism behind the respective decomposition of the PEG network, which follows zero-order kinetics [ 18 ], is still unclear. Interestingly, the exposure of closely related, PEG-substituted self-assembled monolayers (SAMs) to UV light results in the same effect as their exposure to electrons, viz.…”
Section: Resultsmentioning
confidence: 99%
See 3 more Smart Citations