2013
DOI: 10.1016/j.apsusc.2013.04.017
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The effect of surfactants on the electropolishing behavior of copper in orthophosphoric acid

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Cited by 23 publications
(13 citation statements)
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“…is phenomenon might occur through the dipole interaction type between unshared electron pairs of oxygen atom or π-electrons (the extract aromatic ring constituents which considered a wealthy electron source) with the vacant, low energy d-orbitals of iron surface atom. Consistent with the literature molecule with OH groups, complexes with divalent ions may be willingly formed [20][21][22].…”
Section: Electropolishing Of C-steel In H 3 Po 4 With Naturalsupporting
confidence: 81%
See 1 more Smart Citation
“…is phenomenon might occur through the dipole interaction type between unshared electron pairs of oxygen atom or π-electrons (the extract aromatic ring constituents which considered a wealthy electron source) with the vacant, low energy d-orbitals of iron surface atom. Consistent with the literature molecule with OH groups, complexes with divalent ions may be willingly formed [20][21][22].…”
Section: Electropolishing Of C-steel In H 3 Po 4 With Naturalsupporting
confidence: 81%
“…In the presence of 500 ppm extract (Figure 10(j)), the C-steel cracks, heterogeneity, and pits are significantly reduced owing to the protective adsorption film formation offered by guava leaves extract, and clearly, a smooth and regular surface is noticed. e leveling and brightening influences were noticeably improved by the addition of Guava leaves extract where guava leaves extract are satisfying the channels and grain boundaries, and also, the etching effect is removed [27] By comparing the effect of four extracts, it is noticed that the well-polished and uniform C-steel surface is obtained by the addition of 500 ppm marjoram extract where a completely smooth, even, and uniform surface is obtained, and this behavior confirmed the data obtained from the polarization and weight loss method since marjoram extract records highest % inhibition. Table 4 shows that the roughness (Ra) diminished from 2.7 μm to 0.52 μm 8 M H 3 PO 4 -free solution.…”
Section: Kinetic Point Of View For the Electropolishing Processmentioning
confidence: 97%
“…Many studies focused on instructions about the favorable impact of adding certain organic compounds (carboxylic acids or their salts, aldehydes, amines, alcohols) on the process of electrochemical polishing of copper in phosphoricacid solutions [7][8][9][10][11][12][13][14][15][16][17]. The most commonly used as additives are the saturated, unsaturated and aromatic alcohols whose introduction reduces the limiting current density, prevents point etching and metal etching.…”
Section: Literature Review and Problem Statementmentioning
confidence: 99%
“…The limiting current was determined by polarization curves were plotted by increasing the cell current stepwise and measuring the corresponding steady state anode potential [14,15]. Anode potential was measured against a reference steel electrode placed in the cup of luggin tube whose tip is placed 0.5 mm from the anode surface.…”
Section: Measurements Of the Limiting Currentmentioning
confidence: 99%
“…Dimensional analysis was investigated to correlate mass transfer during electropolishing reaction in presence of polymers under forced convection condition (by using rotating cylinder electrode RCE). Physical properties of solution such as density and viscosity were studied [14].…”
Section: Introductionmentioning
confidence: 99%