The effect of surface chemistry and structure of titanium nitride (TiN) films on primary hippocampal cells

Cyster, L.A.; Grant, David M.; Parker, Katherine L.; Parker, Terry L.

doi:10.1016/s1389-0344(02)00021-7

Cited by 43 publications

(26 citation statements)

References 16 publications

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“…2B and D), which might provide positive substrates for neurons to grow. Meanwhile, surface chemistry plays a role in cellular interaction between neurons and substrates [34]. An increase of hydrophilicity is well correlated with an improved adhesion of neuronal cells onto the substrates [35].…”

Section: Discussionmentioning

confidence: 99%

The promotion of neurite sprouting and outgrowth of mouse hippocampal cells in culture by graphene substrates

et al. 2011

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a b s t r a c tGraphene has been demonstrated in many biomedical applications and its potentials for neural interfacing. Emerging concerns on graphene, as a biomedical material, are its biocompatibility and how biologically targeted tissue/cells respond to it. Relatively few studies attempted to address the interactions of graphene or its derivatives with the tissues/cells, while very few reports on neural system. In this study, we tried to explore how neurites, one of the key structures for neural functions, are affected by graphene during the development until maturation in a mouse hippocampal culture model. The results reveal that graphene substrates exhibited excellent biocompatibility, as cell viability and morphology were not affected. Meanwhile, neurite numbers and average neurite length on graphene were significantly enhanced during 2e7 days after cell seeding compared with tissue culture polystyrene (TCPS) substrates. Especially on Day 2 of the neural development period, graphene substrates efficiently promoted neurite sprouting and outgrowth to the maximal extent. Additionally, expression of growthassociate protein-43 (GAP-43) was examined in both graphene and TCPS groups. Western blot analysis showed that GAP-43 expression was greatly enhanced in graphene group compared to TCPS group, which might result in the boost of neurite sprouting and outgrowth. This study suggests the potential of graphene as a material for neural interfacing and provides insight into the future biomedical applications of graphene.

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Section: Discussionmentioning

confidence: 99%

The promotion of neurite sprouting and outgrowth of mouse hippocampal cells in culture by graphene substrates

et al. 2011

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“…The properties of thin films, like preferred orientation of lattice plane and electrical resistance, grown by physical and chemical vapor deposition methods are highly dependent on total gas pressure, partial pressures of reactive gases, deposition rate, temperature and substrate material [9 -15], which makes it suitable for a wide range of applications if the material properties are tuned right. Consequently, patterned TiN is a candidate material for microelectrode arrays [2]. Several studies about structural, mechanical and electrical properties of TiN thin films have been completed in the last years [1 -7, 9 -19].…”

Section: Introductionmentioning

confidence: 99%

“…The electrochemical inactivation of adherently growing bacteria on TiN electrodes in seawater was demonstrated using a potentiostatic treatment that takes advantage of inertness of TiN [24]. On the other hand TiN is considered as a biocompatible material [2,25] and has been used for electrically contacting adherent cells and tissue [26].…”

Section: Introductionmentioning

confidence: 99%

Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

Kirchner¹,

Hallmeier²,

Szargan³

et al. 2007

Electroanalysis

125

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Titanium nitride is a hard and inert conducting material that has yet not been widely used as electrode material for electroanalytical applications although there are highly developed protocols available to produce well adherent micro and nanostructured electrodes. In this paper the possibilities of using titanium nitride thin films for electroanalytical applications is investigated. Scanning electrochemical microscope (SECM) was used for analysis of the redox kinetics of a selected fast redox couple at thin films of titanium nitride (TiN) in different thicknesses. The investigation was carried out by approaching an amperometric ultramicroelectrode (UME) to the TiN film while the soluble redox couple (ferrocenemethanol/ferrociniummethanol) served as mediator in a SECM configuration. The substrate was biased at a potential so that it rereduces the species being produced at the UME, thus controlling the feedback effect. Normalized current -distance curves were fitted to the theoretical model in order to find the apparent heterogeneous standard rate constant (k8) at the sample. The data are further supported by structural investigation of the TiN films using scanning force microscopy and X-ray photoelectron spectroscopy. It was found that the kinetics are little influenced by prolonged storage in air. The heterogeneous standard rate constants in 2 mM ferrocenemethanol were (0.73 AE 0.05) Â 10 À3 cm s À1 for 20 nm TiN thin layer, (1.5 AE 0.2) Â 10 À3 cm s À1 for 100 nm TiN thin layer and (1.3 AE 0.2) Â 10 À3 cm s À1 for 300 nm TiN thin layer after prolonged storage in air. Oxidative surface treatment (in order to remove organic adsorbates) decreased the kinetics in agreement with a thicker oxide layer on the material. The results suggest that their direct use for amperometric detection of reversible redox systems in particular at miniaturized configurations may be advantageous.

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“…They have been used as wear-resistant coatings on high-speed cutting tools [1][2][3], as infrared filtering coatings on windows [4], and as inexpensive decorative coatings on pens, watch dials, and so on [5] because of their golden luster. TiN thin films have also been used as microelectronic contacts [6], resistors [7], and, because of their high-chemical stability, as diffusion barriers [8,9] between interconnects of microchips. A most recent application makes use of their biocompatibility and hemocompatability [10,11], as they have been integrated as surface layers within orthopedic prostheses and cardiac valves [12,13].…”

Section: Introductionmentioning

confidence: 99%

Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen‐Rich TiN Thin Films Synthesized via Reactive Magnetron DC‐Sputtering

Penilla

Wang

2008

Journal of Nanomaterials

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Nitrogen-rich titanium nitride (TiN) thin films containing excess nitrogen up to 87.0 at.% were produced on (100) Si substrates via the reactive magnetron DC-sputtering of a commercially available 99.995 at.% pure Ti target within an argon-nitrogen (Ar-N 2 ) atmosphere with a 20-to-1 gas ratio. The process pressure (P P ) and substrate temperature (T S ) at which deposition occurred were varied systematically between 0.26 Pa-1.60 Pa and between 15.0• C-600• C, respectively, and their effects on the chemical composition, surface morphology, and preferred orientation were characterized by energy dispersive X-ray spectroscopy (EDS), field emission scanning electron microscopy (FE-SEM), and X-ray diffraction (XRD). The EDS analysis confirms increasing nitrogen content with increasing P P and T S . The SEM images reveal a uniform and crystallized surface morphology as well as a closely packed cross-sectional morphology for all crystalline films and a loosely packed cross-sectional morphology for amorphous films. Films produced at lower P P and T S have a pyramidal surface morphology which transitions to a columnar and stratified structure as P P and T S increase. The XRD analysis confirms the existence of only the δ-TiN phase and the absence of other nitrides, oxides, and/or sillicides in all cases. It also indicates that at lower P P and T S , the preferred orientation relative to the substrate is along the (111) planes, and that it transitions to a random orientation along the (200), (220), and (311) planes as P P and T S increase and these results correlate with and qualify those observed by SEM.

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The effect of surface chemistry and structure of titanium nitride (TiN) films on primary hippocampal cells

Cited by 43 publications

References 16 publications

The promotion of neurite sprouting and outgrowth of mouse hippocampal cells in culture by graphene substrates

The promotion of neurite sprouting and outgrowth of mouse hippocampal cells in culture by graphene substrates

Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen‐Rich TiN Thin Films Synthesized via Reactive Magnetron DC‐Sputtering

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