“…34,38,42 An efficient growth of topological insulators on crystalline silicon substrates, such as Si(111) or Si(100), would be attractive for their compatibility with the complementary metal-oxide semiconductor (CMOS) technology. 43,44 However, in view of the integration of TI-based components into electronic devices, it is pivotal to study their growth behavior on oxides (SiO 2 and Al 2 O 3 ), 45,46 as they are relevant, for instance, to develop thermoelectric materials, to investigate the topological states at the interface with the substrate, 47 or to allow back-gating. 48 The crystallinity and the morphological quality are relevant evaluation criteria.…”