Journal of Alloys and Compounds
 2008
DOI: 10.1016/j.jallcom.2007.02.025
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The effect of substrate and annealing temperatures on the microstructure of La1.85Sr0.15CuO4 thin film in pulsed electron deposition process

L.M. Chen
1
,
Wen Tao Liu
2
,
Fanguang Zeng
3
et al.
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