2022
DOI: 10.1016/j.optmat.2021.111829
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The effect of sputtering Ar gas pressure on optical and electrical properties of flexible ECD device with WO3 electrode deposited by RF magnetron sputtering on ITO/PET substrate

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Cited by 15 publications
(8 citation statements)
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“…The IrO 2 film has been proposed as an anodic electrode in ECDs, as it facilitates reversible oxidation and reduction reactions, enabling Li ions to enter and exit the interface between the electrodes and the electrolyte [29,31,32]. In general, electrode films for ECDs consist of an anode and a cathode that can be manufactured using various methods, such as sputtering [33][34][35], chemical deposition [36,37], sol-gel [38,39], dip-coating [40,41], pulsedlaser deposition [42], and electrodeposition [43]. In previous work by the authors, they already fabricated anodic coloring materials (IrO 2 and NiO) and cathodic coloring materials (WO 3 ) using a CAP process.…”
Section: Electrochromic Devices (Ecds) Can Function At Low Voltages A...mentioning
confidence: 99%
“…The IrO 2 film has been proposed as an anodic electrode in ECDs, as it facilitates reversible oxidation and reduction reactions, enabling Li ions to enter and exit the interface between the electrodes and the electrolyte [29,31,32]. In general, electrode films for ECDs consist of an anode and a cathode that can be manufactured using various methods, such as sputtering [33][34][35], chemical deposition [36,37], sol-gel [38,39], dip-coating [40,41], pulsedlaser deposition [42], and electrodeposition [43]. In previous work by the authors, they already fabricated anodic coloring materials (IrO 2 and NiO) and cathodic coloring materials (WO 3 ) using a CAP process.…”
Section: Electrochromic Devices (Ecds) Can Function At Low Voltages A...mentioning
confidence: 99%
“…Additionally, the optical band gap energy (E g ) was calculated using Tauc plots (Figure 6) [31,40]. The values did not vary significantly and were in the range between 1.91 and 2.08 eV.…”
Section: Optical Propertiesmentioning
confidence: 99%
“…Benmoussa et al [35] reported the fundamental absorption edge at about 600 nm, while other authors reported values between 460 and 550 nm [36][37][38][39] for amorphous V2O5 thin films prepared using magnetron sputtering. Additionally, the optical band gap energy (Eg) was calculated using Tauc plots (Figure 6) [31,40]. The values did not vary significantly and were in the range between 1.91 and 2.08 eV.…”
Section: Optical Propertiesmentioning
confidence: 99%
“…However, TCO is not cheap, and the preparation process of WO 3 is relatively complex. For example, Pooyodying, et al, focused on the coating of WO 3 on PET/ITO substrates [ 22 ]. In addition, there are different phases of WO 3, such as orthorhombic, monoclinic (m-WO 3 ), triclinic, tetragonal (t-WO 3 ), hexagonal (h-WO 3 ), etc., [ 23 , 24 , 25 , 26 , 27 ].…”
Section: Introductionmentioning
confidence: 99%