The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Lee, H.Y.; Lee, D.K.; Kang, Dongseok; Lee, J.J.; Joo, Ji Bong

doi:10.1016/j.surfcoat.2004.08.134

Cited by 10 publications

(9 citation statements)

References 18 publications

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“…With the increase of bias voltage, the hardness increases initially and then decreases. Based on the fact that both ratio x(sp 2 )/x(sp 3 ) and x(sp 2 C\N)/x(sp 3 C\N) follow exactly the opposite trend, we can conclude that the decrease of the ratio x(sp 2 )/x(sp 3 ) and x(sp 2 C\N)/x(sp 3 C\N) makes a significant contribution to improving the hardness of CN x films [25][26][27]. The correspondence between bonding configuration and nanoindentation hardness can be explained by the formula H~(E b × a c ) / d 2 (the hardness defined by the product of binding energy E b and the covalency a c divided by the square of bond length d) [46].…”

Section: Composition and Chemical Structurementioning

confidence: 73%

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Microstructure and mechanical properties of a-CN films prepared by bias voltage assisted PLD with carbon nitride target

Zheng

Yang

Chen

et al. 2014

Surface and Coatings Technology

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Amorphous carbon nitride (a-CN x ) films were deposited on silicon substrates using pulsed laser deposition technique (PLD) with a carbon nitride target and a negative bias voltage up to −120 V. The microstructure, chemical composition, bonding configuration and mechanical properties of the films were characterized by using scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, nanoindentation and ball-on-disc abrasion test. The results show that the negative bias voltage promotes the formation of sp 3 hybridization bonding and leads to a great improvement of nitrogen content (up to 38 at.%) in the films. With an increasing bias voltage from −40 V to −120 V, the nitrogen content and the fraction of sp 3 hybridization bonding decrease, leading to an increase in graphitization of the films. A direct dependence of the hardness on the content of sp 3 hybridization bonding is observed. The friction coefficient of the films ranges from 0.20 to 0.28. The film deposited at a bias voltage of −40 V presents the highest hardness value of 8.3 GPa.

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Section: Composition and Chemical Structurementioning

confidence: 73%

“…The results show that the bias voltage dramatically affects the bonding configuration of carbon with/or nitrogen in the films [26,27]. Consequently, by combining a negative bias voltage and the PLD technique, we can expect to alter efficiently the bonding configuration of the CN x films deposited with carbon nitride target.…”

Section: Introductionmentioning

confidence: 99%

Microstructure and mechanical properties of a-CN films prepared by bias voltage assisted PLD with carbon nitride target

Zheng

Yang

Chen

et al. 2014

Surface and Coatings Technology

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“…Bias geriliminin 300V değerine artırılmasıyla bu sefer kaplama kalınlığının 750nm değerine düştüğü görülmektedir. Bu durumun ise bahse konu olan bias gerilimi değerinin plazmada bulunan iyonların oldukça yüksek enerjili olarak taban malzeme üzerine yönlendirerek, daha önce biriken kaplamayı tekrar yerinden geriye sıçratmasıyla (re-sputtering) ilgili olduğu düşünülmektedir [20][21][22]. Şekil 4.…”

Section: Morfolojik İncelemelerunclassified

CrN Kaplanmış AISI 52100 Çeliğinin Atmosfer ve Vakum ortamlarında Aşınma Davranışının İncelenmesi

Kara

2019

Bitlis Eren Üniversitesi Fen Bilimleri Dergisi

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Bu çalışmada farklı taban malzeme bias gerilimleri uygulanarak üretilen CrN kaplamalarının morfolojik, yapısal, kimyasal ve aşınma dayanımı özellikleri incelenmiştir. Sanayide yaygın bir şekilde kullanılan AISI 52100 çeliği taban malzeme olarak seçilmiştir. Kaplama yöntemi olarak fiziksel buhar biriktirme yöntemi kullanılmıştır. Kaplamaların morfolojik özellikleri taramalı elektron mikroskobu kullanılarak incelenmiştir. Kaplamaların kristolografik yapıları X ışını difraksiyonu yöntemi kullanılarak analiz edilmiştir. Kaplamaların kimyasal bileşenleri EDS analizi ile incelenmiştir. Kaplamaların aşınma dayanımı özellikleri 5x10 -3 mbar vakum ve normal atmosfer ortamlarında sabit hız, süre ve yük deney parametrelerinde disk üzeri bilye deney düzeneği kullanılarak incelenmiştir. Aşınma hacimleri temassız optik profilometre ile ölçülmüştür. Aşınma mekanizmaları aşınma izlerinden alınan SEM ve EDS analizleri ile karakterize edilmiştir. Bu çalışmada kullanılan kaplama parametreleriyle elde edilen CrN kaplamaların aşınma dayanımlarını belirlemek için yapılan deneylerden elde edilen sonuçlara göre; atmosfer şartlarında CrN kaplanmış bütün numunelerin, kaplanmamış numunelere göre daha düşük aşınma miktarına sahip olduğu gözlenmiştir. Atmosfer koşullarında en düşük aşınma miktarı, taban malzemelere 200 Volt bias uygulanan numunelerden elde edilirken, vakum ortamında en düşük aşınma miktarı taban malzemelere 100 Volt bias gerilimi uygulanan numunelerden elde edilmiştir. Atmosfer ortamında aşınma mekanizması bütün numunelerde oksidatif ve abrazif olarak gözlemlenirken, vakum ortamında aşınma mekanizması adhezif olarak gözlenmiştir.

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“…Specific plasma discharge configurations and customized plasma reactors are required in order to extract the ions of interest from the plasma and to bring them into the inner part of the metallic mini-tubes. For this reason, a bias voltage was applied to the substrate in order to extend the path length of the ions to the full mini-tube length [21][22][23][24][25]. As the fluorocarbon films are deposited using a pulsed discharge, constant bias values were selected.…”

Section: Introductionmentioning

confidence: 99%

Deposition of fluorocarbon thin films on outer and inner surfaces of stainless steel mini-tubes by pulsed plasma polymerization for stents

Nelea

Holvoet

Turgeon

2009

J. Phys. D: Appl. Phys.

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We report for the first time the deposition of fluorocarbon thin films on outer and inner surfaces of millimetric sized diameter stainless steel mini-tubes by radiofrequency pulsed plasma polymerization for coronary stent applications. The deposition was performed under a glow discharge with a mixture of hexafluorethylene (C2F6) and hydrogen in a post-discharge configuration with substrates kept at floating potential or continuously biased with a negative voltage of up to 1000 V. Film composition, structure, uniformity and covering efficiency on outer and inner surfaces along the mini-tubes were characterized by scanning electron microscopy, Fourier-transformed infrared spectroscopy, x-ray photoelectron spectroscopy and atomic force microscopy. At floating potential, a coating of fluorocarbon (CFx) was deposited varying in chemical composition and thickness along the mini-tube axis. The application of a −400 V bias voltage led to outer surfaces with a fluorocarbon coating uniform in thickness and homogeneous in composition, along the full length of the mini-tube (10 mm). Despite the application of a negative bias, the covering efficiency for the inner surface was lower compared with the outer surface, with fluorocarbon films homogeneous in both composition and thickness until half length of the mini-tube (5 mm) but thickness decreasing afterwards. Strategies for amelioration of the latter limitation are proposed.

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The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Cited by 10 publications

References 18 publications

Microstructure and mechanical properties of a-CN films prepared by bias voltage assisted PLD with carbon nitride target

Microstructure and mechanical properties of a-CN films prepared by bias voltage assisted PLD with carbon nitride target

CrN Kaplanmış AISI 52100 Çeliğinin Atmosfer ve Vakum ortamlarında Aşınma Davranışının İncelenmesi

Deposition of fluorocarbon thin films on outer and inner surfaces of stainless steel mini-tubes by pulsed plasma polymerization for stents

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