The effect of nitrogen incorporation in DLC films deposited by ECR Microwave Plasma CVD

Şeker, Zeynep; Ozdamar, H.; Esen, Mehmet; Esen, Ramazan; Kavak, Hamide

doi:10.1016/j.apsusc.2014.06.137

Cited by 58 publications

(18 citation statements)

References 17 publications

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“…Similar results were reported by other researchers [106,107] Si-DLC XPS C1s spectra are indicated in Figure 4 Figure 4.23, It has been found that Si-C content increases by increasing the target bias and the peaks of SDLC-400 are more symmetric and centered around 101 eV while the peaks of SDLC-800 are more asymmetrical with higher shift shoulder [109,110]. attributed to transition of C1s electrons to σ * , sp 3 C-C, bonds [111].…”

Section: Raman Spectroscopysupporting

confidence: 78%

Fabrication and characterization of adherent diamond-like carbon based thin films on polyethylene terephthalate by end hall ion beam deposition

Ashtijoo

Bhattacherjee

Sutarto

et al. 2016

Surface and Coatings Technology

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The application of Polyethylene terephthalate (PET) has been steadily increasing during recent years. However, its low wear resistance, high gas permeation rate and poor biocompatibility have significantly limited its applications in some specific areas. On the contrary, diamond-like carbon (DLC) possesses many unique properties such as the high hardness, low friction coefficient, high transparency, good gas barrier, excellent biocompatibility, and low synthesis temperature, which makes it an ideal coating material for modifying the surfaces of PET for applications as food and beverage containers and biomedical implants. Nevertheless, the adhesion of DLC on PET is poor due to the high stress induced by ion bombardment during DLC deposition and the large mechanical property mismatch between the coating and the substrate. Therefore, it is very important to develop techniques to lower the stress of DLC and to enhance the adhesion strength of DLC to PET.In the present thesis work, low energy end-hall (EH) ion source and element (N and Si) doping were used to deposit DLC to lower its internal stress and ion beam treatment was performed to modify the surface of PET to enhance the adhesion between DLC and PET. In addition, two different hydrocarbon gases (CH 4 and C 2 H 2 ) were used as precursors for DLC deposition in order to understand the effect of precursor gas. The structure and properties of the treated PET and deposited DLC films were characterized by various advanced techniques: The adhesion of DLC to PET was assessed using scratch testing; the composition and bonding states of DLC and treated PET were analyzed by Raman spectroscopy, Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and near edge X-ray absorption fine structure (NEXAFS); the hardness and Young's modulus were measured by nano-indentation; the tribological properties of the coated materials were evaluated by pin-on-disk sliding testing; and the surface tomography and surface roughness were investigated by atomic force microscopy and N forms sp 3 C-N and sp 2 C=N bonds in the films. Consequently, the hardness values decrease from 11.5 GPa for pure DLC to 7.0 GPa for N-DLC samples whereas the hardness of Si-DLC increases with increasing the silicon content. In addition, N doping can reduce residual stress of DLC and thus increases adhesion of DLC. The DLC films deposited using methane show better properties than using acetylene. By optimizing the conditions, dense, smooth, and adhesive DLC films have been deposited onto PET using EH ion source by combining N doping and O ion treatment with methane as precursor gas.iv AKNOWLEDGEMENTS

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Section: Raman Spectroscopysupporting

confidence: 78%

Fabrication and characterization of adherent diamond-like carbon based thin films on polyethylene terephthalate by end hall ion beam deposition

Ashtijoo

Bhattacherjee

Sutarto

et al. 2016

Surface and Coatings Technology

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“…This shows that one of the effects of nitrogen incorporation in DLC film structure is the increase in sp 2 bonded carbon. [7] In the DLC film (sample 1), the D peak is centered at 1338 cm À1 . After the incorporation of nitrogen in the film, the D peak shifts to 1396 cm À1 , as can be observed in Raman spectra of sample 2.…”

Section: Raman Analysismentioning

confidence: 99%

“…[2,6] In order to improve such properties, many authors have investigated the DLC doping with elements such as B, N and transition metals. [7,8] Kopustinskas et al produced hydrogenated amorphous carbon nitride (α-CN x :H) films (100-200 nm) by electrostatic ion sources from C 6 H 14 + H 2 + N 2 gas mixtures on Si(100) substrates. They observed that the increase of N 2 concentration in the gas mixture resulted in a decrease of growth rate, refractive index, sp 3 bonding and formation of the more graphite-like α-CN x :H films.…”

Section: Introductionmentioning

confidence: 99%

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Leal

Fraga

Rasia³

et al. 2016

Surf. Interface Anal.

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a Because of their outstanding characteristics, diamond-like carbon (DLC) thin films have been recognized as interesting materials for a variety of applications. For this reason, the effects of the incorporation of different elements on their fundamental properties have been the focus of many studies. In this work, nitrogen-incorporated DLC films were deposited on Si (100) substrates by DC magnetron sputtering of a graphite target under a variable N 2 gas flow rate in CH 4 + N 2 + Ar gas mixtures. The influence of high N 2 flow ratios (20, 40 and 60%) on the chemical, structural and morphological properties of N-DLC films was investigated. Different techniques including field emission gun-equipped scanning electron microscope (FEG-SEM), energy-dispersive X-ray spectroscopy (EDS), atomic force microscopy (AFM), profilometry, Rutherford backscattering spectrometry (RBS) and Raman spectroscopy (325-nm and 514-nm excitation) were used to examine the properties of the N-DLC films. Thus, the incorporation of nitrogen was correlated with the morphology, roughness, thickness, structure and chemical bonding of the films. Overall, the results obtained indicate that the fundamental properties of N-DLC films are not only related to the nitrogen content in the film but also to the type of chemical bonds formed.

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“…The incorporation of different elements during the film growth is a significant method used to improve the properties of the film. For example, nitrogen incorporation improves the hardness of the film, while fluorine incorporation results in good hemocompatibility and antibacterial activity [8][9][10]. Deuterated amorphous carbon films (a-C:D) deposited by plasma-assisted chemical vapor deposition (PECVD) using deuterium as the precursor gas were also investigated for some specific applications, such as ultra-cold neutron storage devices or neutron mirrors [11,12].…”

Section: Introductionmentioning

confidence: 99%

Effect of incorporation of deuterium on vacancy-type defects of a-C:H films prepared by plasma CVD

Ozeki

Sekiba

Uedono

et al. 2015

Applied Surface Science

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The effect of nitrogen incorporation in DLC films deposited by ECR Microwave Plasma CVD

Cited by 58 publications

References 17 publications

Fabrication and characterization of adherent diamond-like carbon based thin films on polyethylene terephthalate by end hall ion beam deposition

Fabrication and characterization of adherent diamond-like carbon based thin films on polyethylene terephthalate by end hall ion beam deposition

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Effect of incorporation of deuterium on vacancy-type defects of a-C:H films prepared by plasma CVD

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The effect of nitrogen incorporation in DLC films deposited by ECR Microwave Plasma CVD

Cited by 58 publications

References 17 publications

Fabrication and characterization of adherent diamond-like carbon based thin films on polyethylene terephthalate by end hall ion beam deposition

Fabrication and characterization of adherent diamond-like carbon based thin films on polyethylene terephthalate by end hall ion beam deposition

Impact of high N2flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Effect of incorporation of deuterium on vacancy-type defects of a-C:H films prepared by plasma CVD

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Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films