The purity of fluids exposed to a wafer is critical as the node sizes are approaching low single digit nanometers. The potential impurities could be solid or semi-solid particles, soluble metal cations, anions, organic species, or gases. All these need to be removed for optimum yield and minimal defects. The technical challenge associated with reducing the node sizes also relates to membranes production as membranes with low single digit pore sizes are needed to remove nanometer impurities. The interest in nylon membrane is twofold as it can mechanically remove fine particles as well as by its adsorptive capabilities. In this study, nylon membranes with pore sizes of 2, 5, 10, and 20 nm were characterized for microstructure, flow rate versus pressure drop, bubble point, and metal extractables in PGMEA.