The effect of ion energy on the chemistry of air-aged polymer films grown from the hyperthermal polyatomic ion Si2OMe5+

Brookes, Pat N.; Fraser, Stuart T.; Short, Robert D.; Hanley, Luke; Fuoco, Erick; Roberts, Adam; Hutton, Simon

doi:10.1016/s0368-2048(01)00340-1

Cited by 48 publications

(78 citation statements)

References 26 publications

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“…However, comparison with calculations for hyperthermal ions [35] shows that this assumed sticking probability is probably an overestimation. This study showed a more realistic sticking probability of between 20 and 50%, and is dependent on the ion energy [37].…”

Section: Sticking Probabilitymentioning

confidence: 98%

“…Thus, it was implied that ions provided energy to the surface through energetic collisions which enabled further reactions to occur [34], but their role in contributing mass to films was discounted. As discussed below, there is now growing experimental evidence to support ions playing a greater role in plasma polymer growth [35][36][37].…”

Section: Plasma Polymer Filmsmentioning

confidence: 99%

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The importance of ions in low pressure PECVD plasmas

2015

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Plasma enhanced chemical vapor deposition (PECVD) can be used to fabricate surfaces with a wide range of physical and chemical properties and are used in a variety of applications. Despite this, the mechanisms by which PECVD films grow are not well understood. Moreover, the species which contribute to film growth can be considered quite differently depending on the process. Particularly for functionalized plasma polymer films, the growth mechanisms are considered with respect to the chemistry of the depositing species, ignoring the physics of plasmas. Here we analyse the role ions play in the deposition of three common classes of depositing plasmas, and how these closely related fields treat ions very differently.

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Section: Sticking Probabilitymentioning

confidence: 98%

Section: Plasma Polymer Filmsmentioning

confidence: 99%

The importance of ions in low pressure PECVD plasmas

2015

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“…[153][154][155][156] The mechanism to explain these phenomena centred on the energies at which depositing species arrive at the surface of the substrate. Under low pressure, low power conditions commonly used for fabrication of functional polymer coatings, neutral species such as radicals and unfragmented precursor molecules reach the surface at nearly ambient temperature (0.03-0.05 eV).…”

Section: Controlling Plasma-assisted Surface Modificationmentioning

confidence: 99%

Anti-bacterial surfaces: natural agents, mechanisms of action, and plasma surface modification

et al. 2015

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REVIEW This journal isStrategies that confine antibacterial and/or antifouling property to the surface of the implant, by modifying the surface chemistry and morphology or by encapsulating the material in an antibiotic-loaded coating, are most promising as they do not alter bulk integrity of the material. Among them, plasma-assisted modification and catechol chemistry stand out for their ability to modify a wide range of substrates. By controlling processing parameters, plasma environment can be used for surface nano structuring, chemical activation, and deposition of biologically active and passive coatings. Catechol chemistry can be used for material-independent, highlycontrolled surface immobilisation of active molecules and fabrication of biodegradable drugloaded hydrogel coatings. In this article, we comprehensively review the role plasma-assisted processing and catechol chemistry can play in combating bacterial colonisation on medically relevant coatings, and how these strategies can be coupled with the use of natural antimicrobial agents to produce synthetic antibiotic-free antibacterial surfaces.

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“…There exist a number of reports11, 17, 18, 21, 31 in the field of thin‐film deposition from silicon–organic monomers that have used XPS analysis for layer characterization. Unfortunately, none of these works discusses the internal layer ratios; only the material compositions are considered.…”

Section: Introductionmentioning

confidence: 99%

Diagnostics of SiO_x‐Containing Layers Deposited on Powder Particles by Dielectric Barrier Discharge

Hähnel

Brüser

Kersten

2007

Plasma Processes & Polymers

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We report on the analysis of the composition and internal structure of SiOx layers deposited on powder particles by using HMDSO as monomer, different oxygen admixtures in argon, and a dielectric barrier surface discharge under atmospheric pressure. Composition and structure of the deposited layers with special regard to silicon, carbon, and hydrocarbon bonding were studied by FTIR and XPS measurements and compared with previous investigations from the literature. For correlation of the layer composition and the plasma gas phase we used mass spectrometric analysis of the exhaust gas. The stoichiometric ratios of the deposited layers are remarkably influenced by the Ar/O2 ratio and the discharge conditions.

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The effect of ion energy on the chemistry of air-aged polymer films grown from the hyperthermal polyatomic ion Si2OMe5+

Cited by 48 publications

References 26 publications

The importance of ions in low pressure PECVD plasmas

The importance of ions in low pressure PECVD plasmas

Anti-bacterial surfaces: natural agents, mechanisms of action, and plasma surface modification

Diagnostics of SiO_x‐Containing Layers Deposited on Powder Particles by Dielectric Barrier Discharge

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The effect of ion energy on the chemistry of air-aged polymer films grown from the hyperthermal polyatomic ion Si2OMe5+

Cited by 48 publications

References 26 publications

The importance of ions in low pressure PECVD plasmas

The importance of ions in low pressure PECVD plasmas

Anti-bacterial surfaces: natural agents, mechanisms of action, and plasma surface modification

Diagnostics of SiOx‐Containing Layers Deposited on Powder Particles by Dielectric Barrier Discharge

Contact Info

Product

Resources

About

Diagnostics of SiO_x‐Containing Layers Deposited on Powder Particles by Dielectric Barrier Discharge