The effect of heat treatment temperature and Mg doping on structural and photocatalytic activity of ZnO thin films fabricated by RF magnetron co-sputtering technique

Kuru, Mehmet; Narsat, Hilal

doi:10.1007/s10854-019-02202-2

Cited by 17 publications

(8 citation statements)

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“…The average crystal sizes (D) of the films were calculated with the help of the Debye-Scherrer equation given by equation 1 [7].…”

Section: Resultsmentioning

confidence: 99%

“…This narrow band gap is one of the main factors that reduce the photocatalytic activity of ZnO and is one of the most important barriers to its use in commercial applications. In recent studies [7], it has been observed that the addition of elements with different properties to ZnO increases the photocatalytic activity of ZnO by creating band energy gap and surface defects.…”

Section: Introductionmentioning

confidence: 99%

“…Many of the semiconductor metal oxides have been extensively studied because they retain their stable structure when stimulated by UV and visible light. These can be referred to as Titanium Oxide (TiO2), Cerium Oxide (CeO2), Zinc Oxide (ZnO), Tin Oxide (SnO2), Tungsten Oxide (WO3) and Zirconium Oxide (ZrO3) [6,7]. ZnO, which is one of the semiconductor metal oxides, is preferred more than other metal oxides in the removal of organic pollutants due to its antibacterial, high quantum yield and environmentally friendly [8].…”

Section: Introductionmentioning

confidence: 99%

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The Effect of Thickness on Photocatalytic Performance in MgZnO Thin Films

Kuru

2020

Sakarya University Journal of Science

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In this study, the effect of thickness of MgZnO thin films which provide high efficiency as photocatalyst under UV light on structural and photocatalytic performance was investigated. For this reason, MgZnO thin films were produced by RF/DC magnetron sputtering technique at room temperature. MgZnO thin films at different thicknesses were deposited on Si (100) substrate and samples were subsequently annealed in the oven at 400 °C for 1 hour. Structural and morphological properties of MgZnO thin films were investigated using the Scanning Electron Microscopy (SEM), Grazing Incident X-ray diffraction (GIXRD) and Atomic Force Microscopy (AFM). All films have hexagonal-wurtzite crystal structure. Also, the crystallite size was 22.95 nm for the 400 nm film and the average crystallite size rised to 35.42 nm with increasing film thickness. The results showed that the structural properties roughness and surface morphology of the films varied depending on the thickness. Also, photocatalytic performances of MgZnO thin films at different thicknesses were measured by UV-Vis spectroscopy. The reaction rate constant (k) for MgZnO photocatalyst with a thickness of 800 nm was calculated as 27.86x10-2 s-1. This result shows that photocatalysts of different thickness suitable with the first-order velocity law because the thin films degradation in the low concentration methylene blue (MB) solution.

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“…The average crystal sizes (D) of the films were calculated with the help of the Debye-Scherrer equation given by equation 1 [7].…”

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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The Effect of Thickness on Photocatalytic Performance in MgZnO Thin Films

Kuru

2020

Sakarya University Journal of Science

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“…The functional group of these dye molecules can be adsorbed on the surface of Ag@ZnO nanocomposites. As soon as 4 − ions supply electrons to Ag@ZnO nanocomposites, these electrons accumulate in Ag NPs and are trapped by adsorbed oxygen molecules to form 2 * and * OH radicals [15,20,22]. These radicals react with the functional group of MO and RhB adsorbed, destroying the molecular structure of the dyes.…”

Section: Figure 8 the Variation Of Ln(a/a0) As A Function Of Time For 24h Ag Decorated Zno Thin Films In Rhb And Momentioning

confidence: 99%

“…In this study, a multi-functional surface was produced by decorating plasmonic Ag NSs onto ZnO films fabricated by RF magnetron sputtering technique on Si (100) substrate. Various methods such as RF/DC magnetron sputtering, chemical vapor deposition (CVD), pulsed laser deposition (PLD), organic vapor phase epitaxy (MOVPE), molecular beam epitaxy (MBE), and sol-gel are used in the production of ZnO thin films [21,22]. Magnetron sputtering, in particularly, enables tuning of the chemical composition and practically rates of film deposition.…”

Section: Introductionmentioning

confidence: 99%