2010
DOI: 10.1021/nl102121e
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The Effect of Electrostatic Screening on a Nanometer Scale Electrometer

Abstract: We investigate the effect of electrostatic screening on a nanoscale silicon MOSFET electrometer. We find that screening by the lightly doped p-type substrate, on which the MOSFET is fabricated, significantly affects the sensitivity of the device. We are able to tune the rate and magnitude of the screening effect by varying the temperature and the voltages applied to the device, respectively. We show that despite this screening effect, the electrometer is still very sensitive to its electrostatic environment, e… Show more

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Cited by 2 publications
(3 citation statements)
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“…We fabricate an n-channel MOSFET according to standard CMOS methods, as previously described. 9,10 We begin with a p-type silicon substrate that is doped with boron at a level of 4 × 10 15 cm −3 . We implant phosphorous ions in two regions of the silicon substrate with dimensions 100 × 150 µm 2 , and separated by 100 µm, to serve as the source and drain electrodes.…”
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confidence: 99%
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“…We fabricate an n-channel MOSFET according to standard CMOS methods, as previously described. 9,10 We begin with a p-type silicon substrate that is doped with boron at a level of 4 × 10 15 cm −3 . We implant phosphorous ions in two regions of the silicon substrate with dimensions 100 × 150 µm 2 , and separated by 100 µm, to serve as the source and drain electrodes.…”
mentioning
confidence: 99%
“…The charge transient is analyzed as follows: We treat the amorphous germanium as a distributed RC network, as shown in Figure a. When the amorphous germanium is subject to a step voltage at one edge, charge diffuses through the film with a diffusion constant of D = 1/ R sq C , where R sq is the resistance per square, and C is the capacitance per unit area of the film.…”
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confidence: 99%
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