The effect of electron dose on positive polymethyl methacrylate resist for nanolithography of gold bowtie nanoantennas

Campbell, Caroline; Casey, Abigail; Triplett, Gregory

doi:10.1016/j.heliyon.2022.e09475

Cited by 1 publication

(1 citation statement)

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“…Electron beam lithography (EBL) was used to create a test structure with various dose from 250-350 𝜇C/cm 2 with voltage 30 kV, beam intensity 8 W/cm 2 , beam current 0.142 nA, spot size 2.6 nm and write field 300 𝜇m. When e-beam resist is exposed by electron beam, the electron beam induces the breaking of cross-link within long chain polymer and forms small chain polymer [4][5], then to remove the small chain polymer, the develop process begins i.e., the wafer was soaked in developer MIBK:IPA with ratio 1:3 for 2 minutes then rinsed with RO water. The wafer was coated by gold using evaporation method.…”

Section: Dose Testmentioning

confidence: 99%

The effect of under and over develop time in Josephson junction fabrication process using electron beam lithography

Aketasaeng,

Sangtawesin,

Kittiwatakul

2023

J. Phys.: Conf. Ser.

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In the 1960s, the physicist Brian Josephson introduced the concept of Josephson tunnel junctions, which involve the tunneling of Cooper pairs across a barrier between superconducting electrodes. The typical methods of fabricating Josephson junction such as Dolan bridge and cross-type technique require specialized equipment for angle deposition. In this work, we present Josephson junction fabrication process using electron beam lithography that eliminates the need for angle deposition. The dose test was performed to optimize the right dose and we also explored various develop time. We observed that for PMMA A9 film with thickness 1.3 μm, the electron dose 280 μC/cm2 and develop time between 1.30 – 2.00 minutes produces clear pattern with sharp features. The effect of under and over develop time is shown such that there are resist residue left on the substrate after lift-off process and the longer develop time created an undercut.

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Section: Dose Testmentioning

confidence: 99%