1999
DOI: 10.1002/(sici)1097-4628(19991227)74:14<3287::aid-app1>3.0.co;2-w
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The effect of curing history on the residual stress behavior of polyimide thin films

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Cited by 35 publications
(23 citation statements)
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“…All PI films prepared in this study exhibit good transparency in the visible region, and no scattering of light was observed. Although some rigid‐structured PIs exhibit semi‐crystalline nature,7, 8, 14, 25–28 no peaks related to crystalline components are observed in the WAXD patterns for the present PI films as shown in Figure 2. The shoulder peaks observed around 2Θ = 20° are assigned to amorphous halos.…”
Section: Resultsmentioning
confidence: 74%
“…All PI films prepared in this study exhibit good transparency in the visible region, and no scattering of light was observed. Although some rigid‐structured PIs exhibit semi‐crystalline nature,7, 8, 14, 25–28 no peaks related to crystalline components are observed in the WAXD patterns for the present PI films as shown in Figure 2. The shoulder peaks observed around 2Θ = 20° are assigned to amorphous halos.…”
Section: Resultsmentioning
confidence: 74%
“…Research conducted over the past decade has understood the importance of considering the polymer film morphological contributions to the residual stress as well as its moisture‐induced stress–relaxation behavior of polymer films 5, 17–20. Rigid polymers such as poly( p ‐phenylene pyromellitimide) (PMDA‐PDA) and poly( p ‐phenylene biphenyltetracaboximide) (BPDA‐PDA) showed high chain rigidities and orders with relatively low stress, which are highly required in the fabrication of microelectronic devices 21, 22.…”
Section: Introductionmentioning
confidence: 99%
“…Hence, the X‐ray diffraction patterns did not seem to be affected by the change in the more ordered ODA content. ODA has also been reported to impart amorphous morphology to polyimides 31, 34, 36…”
Section: Resultsmentioning
confidence: 99%
“…The residual stresses of the films were measured with a thin‐film stress analyzer 30–33. The curvatures of the Si wafers with and without films were measured at room temperature with a HeNe laser beam in the temperature range of 25–220 °C.…”
Section: Methodsmentioning
confidence: 99%