The effect of complexing agents on the oriented growth of electrodeposited microcrystalline cuprous oxide film

Zhang, Zhen; Hu, Wenbin; Deng, Yida; Zhong, Cheng; Wang, Haoren; Wu, Yating; Liu, Lei

doi:10.1016/j.materresbull.2012.04.146

Cited by 18 publications

(6 citation statements)

References 22 publications

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“…The effect of solution pH and deposition potential for Cu 2 O thin films prepared on different substrates was reported earlier [65,79]. Ma et al [66] and Zhang et al [67] investigated the role of complexing agents such as lactic acid, citric acid, and EDTA which is shown in Figure 8(a)-8(c) [66,67]. The Cu 2 O films electrodeposited with complexing agent citric acid found to exhibit preferential orientation along (111).…”

Section: Morphologysupporting

confidence: 52%

“…The influence of various substrates such as stainless steel, indium tin oxide (ITO), platinum for Cu 2 O, and CuO thin films was reported earlier [12,47,[50][51][52][53][54][55][56][57][58][59][60][61][62][63][64][65][66][67][68]. The source of chemicals used were copper acetate (Cu(CH 3 COO) 2 •H 2 O)) [18], copper sulfate pentahydrate (CuSO 4 •5H 2 O) [51], cupric nitrate trihydrate (Cu(NO 3 ) 2 •3H 2 O) [53,54], and cupric chloride dihydrate (CuCl 2 •2H 2 O) [52] for the preparation of precursors.…”

Section: Electrodeposition Of Cuo and Cu 2 Omentioning

confidence: 84%

“…Also, the films complexed with lactic acid are found to exhibit the most prominent reflection along (111) plane. Zhang et al [67] reported that Cu 2 O films addition with EDTA exhibit prominent reflection (200) along the surface of the substrate as Figure 9. Microscopic images of CuO deposited on ITO substrate at different time intervals in between 5 and 40 min as shown in Figure 10.…”

Section: Morphologymentioning

confidence: 99%

See 2 more Smart Citations

Influence of Deposition Parameters for Cu2O and CuO Thin Films by Electrodeposition Technique: A Short Review

Arulkumar,

Thanikaikarasan,

Tesfie

2023

Journal of Nanomaterials

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The transition metal oxide-based nanomaterial attracted researchers for its various applications due to its interesting physical, chemical, and optical properties. Copper oxide thin films with different oxidation states were prepared on various transparent, nontransparent nature conducting substrates from the acidic and alkaline medium by electrodeposition technique. The deposition parameters such as potential, bath temperature, solution pH, and deposition time determine the physical, chemical, and optical properties. The complexing agents such as sodium thiosulfate, lactic acid, citric acid, and triethanolamine determine the stability of cuprous and cupric ions in the deposited films. Optical properties reported that the deposited films have direct band gap value 1.3 and 3.7 eV represents the absorbance of the deposited films in the visible region of solar spectrum. The absorbance of light in visible region, good electrical conductivity, and various nanostructure morphologies with the environment-friendly constituents are the distinctive properties of copper metal oxides.

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Section: Morphologysupporting

confidence: 52%

Section: Electrodeposition Of Cuo and Cu 2 Omentioning

confidence: 84%

Section: Morphologymentioning

confidence: 99%

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Influence of Deposition Parameters for Cu2O and CuO Thin Films by Electrodeposition Technique: A Short Review

Arulkumar,

Thanikaikarasan,

Tesfie

2023

Journal of Nanomaterials

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“…1b) exhibiting reduced optical reection desirable for photovoltaic applications. 18 A 5 nm thick a-ZTO buffer layer and an 80 nm thick AZO layer are sequentially deposited by ALD at 120 C. Crosssectional images of the solar cells taken with high-resolution transmission electron microscopy (HR-TEM) show the individual layers clearly (Fig. 1d).…”

mentioning

confidence: 99%

Ultrathin amorphous zinc-tin-oxide buffer layer for enhancing heterojunction interface quality in metal-oxide solar cells

Lee

Heo

Siah

et al. 2013

Energy Environ. Sci.

164

160

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We demonstrate a tunable electron-blocking layer to enhance the performance of an Earth-abundant metal-oxide solar-cell material. A 5 nm thick amorphous ternary metal-oxide buffer layer reduces interface recombination, resulting in sizable open-circuit voltage and efficiency enhancements. This work emphasizes the importance of interface engineering in improving the performance of Earth-abundant solar cells. Thin lm solar cells comprising Earth-abundant, non-toxic, and air-stable materials represent a promising class of photovoltaic (PV) devices compatible with terawatts-scale deployment. 1-3 Cuprous oxide (Cu 2 O) is one of several candidate materials under consideration with the potential to reach 20% power conversion efficiency. 4,5 Doping this material to make it n-type has proven to be challenging, thus a common PV device architecture comprises a Cu 2 O-ZnO heterojunction structure. However, device efficiencies remain low, with wafer-based Cu 2 O devices (by thermal oxidation of Cu sheets at $1010 C) reaching 4.1% (ref. 6) and thin lm Cu 2 O devices (by electrochemical deposition) reaching 1.3% (ref. 7). The open-circuit voltage (V OC) of these devices is signicantly below the theoretical limit of Cu 2 O, due to a low built-in potential caused by non-ideal band alignment between the absorber and transparent conducting oxide (TCO), and a high recombination-current driven by interface-traps. 8,9 To mitigate the latter voltage-loss mechanism, we introduce a thin ($5 nm) buffer layer between the absorber and the TCO. This layer serves as an electron-blocking layer, reducing the magnitude of the recombination current at the absorber-TCO interface. This approach is reminiscent of the Si-based heterojunction with intrinsic thin layer (HIT) devices, which exhibit V OC superior to the best Si homojunction devices by creating a small energy barrier with a low density of interface-traps. 10 This energy barrier is expressed as a conduction-band offset (DE CB) of the buffer layer relative to the absorber layer; DE CB must be carefully "tuned" to avoid current losses (stemming from too high DE CB) or voltage losses (stemming from a negative DE CB). 11 This tunability can be achieved by using ternary compounds for the buffer layer, whereby the ratio of two cations (anions) typically modies the conduction (valence) band position. 12,13 Judicious composition selection of this ternary compound allows one to simultaneously limit the concentrations of carriers at the interface as well as reduce the interface-trap density, which reduces dark saturation current density (J 0) and increases V OC. To achieve maximum benet, this layer needs to

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“…Electrodeposition is one of the oldest and most environmentally friendly methods for producing nanostructured layers, mainly nanowires, nanotubes, or particles with well-defined facets. − So far, Cu 2 O layers have been obtained by applying different electrolytes, surfactants, and pH adjustment . This significantly affected the form of the grains and their packing.…”

Section: Results and Discussionmentioning

confidence: 99%

Copper Oxide Electrochemical Deposition to Create Antiviral and Antibacterial Nanocoatings

Kusior,

Mazurkow,

Jelen

et al. 2024

Langmuir

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The impact of the reaction environment on the formation of the polycrystalline layer and its biomedical (antimicrobial) applications were analyzed in detail. Copper oxide layers were synthesized using an electrodeposition technique, with varying additives influencing the morphology, thickness, and chemical composition. Scanning electron microscopy (SEM) images confirmed the successful formation of polyhedral structures. Unmodified samples (CuL) crystallized as a mixture of copper oxide (I) and (II), with a thickness of approximately 1.74 μm. The inclusion of the nonconductive polymer polyvinylpyrrolidone (PVP) during synthesis led to a regular and compact CuO-rich structure (CuL-PVP). Conversely, adding glucose resulted in forming a Cu 2 O-rich nanostructured layer (CuL-D(+)G). Both additives significantly reduced the sample thickness to 617 nm for CuL-PVP and 560 nm for CuL-D(+)G. The effectiveness of the synthesized copper oxide layers was demonstrated in their ability to significantly reduce the T4 phage titer by approximately 2.5−3 log. Notably, CuL-PVP and CuL-D(+)G showed a more substantial reduction in the MS2 phage titer, achieving about a 5-log decrease. In terms of antibacterial activity, CuL and CuL-PVP exhibited moderate efficacy against Escherichia coli, whereas CuL-D(+)G reduced the E. coli titer to undetectable levels. All samples induced similar reductions in Staphylococcus aureus titer. The study revealed differential susceptibilities, with Gram-negative bacteria being more vulnerable to CuL-D(+)G due to its unique composition and morphology. The antimicrobial properties were attributed to the redox cycling of Cu ions, which generate ROS, and the mechanical damage caused by nanostructured surfaces. A crucial finding was the impact of surface composition rather than surface morphology on antimicrobial efficacy. Samples with a dominant Cu 2 O composition exhibited potent antibacterial and antiviral properties, whereas CuO-rich materials showed predominantly enhanced antiviral activity. This research highlights the significance of phase composition in determining the antimicrobial properties of copper oxide layers synthesized through electrodeposition.

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The effect of complexing agents on the oriented growth of electrodeposited microcrystalline cuprous oxide film

Cited by 18 publications

References 22 publications

Influence of Deposition Parameters for Cu2O and CuO Thin Films by Electrodeposition Technique: A Short Review

Influence of Deposition Parameters for Cu2O and CuO Thin Films by Electrodeposition Technique: A Short Review

Ultrathin amorphous zinc-tin-oxide buffer layer for enhancing heterojunction interface quality in metal-oxide solar cells

Copper Oxide Electrochemical Deposition to Create Antiviral and Antibacterial Nanocoatings

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