Abstract:Nickel chromium oxide (NiCrO) deposition has been carried out on a glass substrate with a variation of the Argon / oxygen (Ar:O) gas ratio using DC sputtering. The purpose of this study is to determine the effect of the Ar: O gas ratio on the energy gap of the NiCrO layer. NiCrO thin film deposition was carried out using a variation ratio of Argon gas and oxygen 60:40, 70:30, 80:20, and 90:10. To determine the phase formed was analyzed using X-Ray Diffraction (XRD). UV-Vis spectrophotometer test was carried ou… Show more
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