2011
DOI: 10.1007/s10894-011-9395-2
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The Effect of Applied Voltage and Operating Pressure on Emitted X-Ray from Nitrogen (N2) Gas in APF Plasma Focus Device

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Cited by 14 publications
(4 citation statements)
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“…SXRs from PF devices operated with Ne and N gases are characterized for different discharge voltages and gas pressures [12][13][14]. After determining optimum gas pressure and discharge voltage for high x-ray yield, it was concluded that x-ray yield strongly depends on gas pressure and discharge voltage in PF devices.…”
Section: Introductionmentioning
confidence: 99%
“…SXRs from PF devices operated with Ne and N gases are characterized for different discharge voltages and gas pressures [12][13][14]. After determining optimum gas pressure and discharge voltage for high x-ray yield, it was concluded that x-ray yield strongly depends on gas pressure and discharge voltage in PF devices.…”
Section: Introductionmentioning
confidence: 99%
“…Roomi et al investigated effect of the voltage and operating pressure on the soft and hard x-ray production using nitrogen as a working gas [10]. It is found that soft x-ray and hard x-ray emissions from the plasma focus device have different optimum conditions.…”
Section: Introductionmentioning
confidence: 99%
“…Since soft x-ray and hard x-ray emission have different production mechanisms in the PF devices, they also have different optimum operating conditions. Therefore, PF devices can be optimized for either soft x-ray emission or hard x-ray emission even though increasing charging voltage increases both soft x-ray and hard x-ray emissions, which shows that x-ray production has a strong correlation with charging voltage in the cylindrical plasma focus devices [10].…”
Section: Introductionmentioning
confidence: 99%