The effect of annealing treatment on microstructure and properties of indium tin oxides films

Yang, Cheng‐Hsien; Lee, Shih-Chin; Chen, Suz-cheng; Lin, Tien-Chai

doi:10.1016/j.mseb.2006.01.012

Cited by 66 publications

(21 citation statements)

References 21 publications

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“…The lowest resistivity (8.7×10 −4 Ω-cm) was obtained from ITO films deposited at 450°C. Although this value is higher than that (1-6×10 −4 Ω-cm) of the film deposited using conventional ceramic target [21][22][23][24][25], the ITO films in this work is applicable to low cost transparent electrode for optoelectronic devices such as touch panel. The resistivity did not show significant temperature dependence, thus proving that the ITO films are degenerate semiconductors.…”

Section: Resultsmentioning

confidence: 76%

Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering

Lee

2008

J Electroceram

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Indium tin oxide (ITO) films have been prepared by r.f. magnetron sputtering using powder target. X-ray diffraction analysis indicates that the deposited films were polycrystalline and retained a cubic bixbite structure. The ITO films deposited at low substrate temperature (T s ) exhibit a (411) preferred orientation but the films deposited at high T s prefer a (111) orientation. The substrate temperature was found to significantly affect the electrical properties. As the T s was increased, the conductivity of ITO films was improved due to thermally induced crystallization. The lowest resistivity (8.7×10 −4 Ω-cm) was obtained from ITO films deposited at 450°C. However, optical properties of the films were somewhat deteriorated. The infrared (IR) reflectance of the film increases with increasing the substrate temperature.Keywords ITO film . Sputtering . Powder target . Substrate temperature 2 Experimental ITO films were prepared by a commercial r.f. magnetron sputtering system. The chamber was pumped by a turbomolecular pump and the base pressure before deposition was about 1.3×10 −3 Pa. ITO powders with SnO 2 content of 10°wt% were used as targets after slightly compressing them into a cupper holder, 3 in. in diameter. The substrate J Electroceram (2009) 23:554-558

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Section: Resultsmentioning

confidence: 76%

Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering

Lee

2008

J Electroceram

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“…Compared with the as-deposited films, the annealed films have higher transmissivity. During annealing, the optical transmittance increased not only with SnO converting into transparent SnO 2 [16], but also with the decrease of the number of defects (vacancies and interstitial impurities) in the crystalline structure of films [17]. Figures 5(a) and (b) were reflectance spectra of the asdeposited and annealed films, respectively.…”

Section: Microstructure Analysismentioning

confidence: 99%

Microstructure and optical properties of nano Ag-ITO films

Xiao

Cao

Song

et al. 2010

Sci. China Technol. Sci.

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Nano Ag-ITO films with Ag volume fraction of 0.3%−1.0% were prepared by radio-frequency magnetron co-sputtering and analyzed by X-ray diffraction, scanning electron microscopy and ultraviolet-visible spectroscopy. Microstructure analysis shows that the films are composed of polycrystalline ITO matrix embedded with Ag nanoparticles with a mean size of 60-100 nm. Transmissivity spectra of Ag-ITO films indicate that the visible light transmissivity of the films decreases with increasing the Ag fraction. The transmissivity of the annealed films is higher than that of the as-deposited films. The volume 0.3% Ag-ITO films have the highest light reflectance. The annealed films exhibit lower light absorptance than as-deposited films. A surface plasmon resonance (SPR) peak of volume 0.3% Ag-ITO films is located around 510 nm. Compared with the annealed ITO film, the annealed volume 0.3% Ag-ITO film shows 10% higher reflectivity, while its transmittance is almost the same as that of the annealed ITO film, indicating its potential application in new-type transflective displays. nanoparticle films, microstructure, optical properties, transflective displays Citation: Xiao L, Cao C B, Song X P, et al. Microstructure and optical properties of nano Ag-ITO films.

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“…Lai et al [16] studied the effect of different oxidation temperatures of NiO deposited onto indium tin oxide (ITO) sheets on the performance of PSCs and they reported that the maximum efficiency at 450 °C was 7.75%. However, ITO substrate is instable at high oxidation temperatures [17], and the resistivity of the sheets is increased with increasing the temperature [18] which may affect the result of the cell performance.…”

Section: Introductionmentioning

confidence: 99%

Thermal oxidation of sputtered nickel nano-film as hole transport layer for high performance perovskite solar cells

Aboulsaad

Tahan

Soliman

et al. 2019

J Mater Sci: Mater Electron

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The effect of rapid oxidation temperature on the sputtered nickel (Ni) films to act as a hole transport layer (HTL) for perovskite solar cell (PSCs) was investigated. A nano-sputtered Ni film with a thickness about 100 nm was oxidized at a range of different oxidation temperatures between 350 and 650 °C to work as HTL in an inverted p-in configuration. DC Hall measurement in van der Pauw configuration and photoluminescence spectroscopy were used to measure the charge's mobility and extraction of nickel oxide (NiO) films. The behaviour of the carrier concentration measurements of NiO layers at different oxidation temperatures showed that the Ni layer oxidized at 450 °C had the highest carrier concentration among the other samples. The performance measurements of the fabricated PSCs showed that the nickel oxide hole-transporting layer which has been oxidized at the optimum oxidation temperature of 450 °C has the highest power conversion efficiency (PCE) of 12.05%. Moreover, the characteristic parameters of the optimum cell such as the open-circuit voltage (V OC), short-circuit current density (J SC) and fill factor (FF) were 0.92 V, 19.80 mA/cm 2 and 0.331, respectively.

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The effect of annealing treatment on microstructure and properties of indium tin oxides films

Cited by 66 publications

References 21 publications

Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering

Effects of substrate temperature on electrical and optical properties ITO films deposited by r.f. magnetron sputtering

Microstructure and optical properties of nano Ag-ITO films

Thermal oxidation of sputtered nickel nano-film as hole transport layer for high performance perovskite solar cells

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