The effect of annealing on the structure of cathodic arc deposited amorphous carbon nitride films

McCulloch, D. G.; Merchant, A. R.

doi:10.1016/s0040-6090(96)09069-4

Cited by 44 publications

(8 citation statements)

References 10 publications

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“…CN x graphitization occurred when desorption of nitrogen atoms from the CN x matrix was caused by raising the annealing temperature. Generally, the transition temperature of CN x is about 200ºC, which corresponds to a sp 3 -sp 2 transition temperature [8]. However, during sliding, the transition temperature can be decreased to a lower value, due to the high contact stress [9,10].…”

Section: Effect Of the Thickness Of Transfer Layer On Friction Coeffimentioning

confidence: 99%

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Effect of Transfer Layer on Ultra Low Friction of CNx Coating under Blowing Dry Ar

et al. 2013

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In order to clarify the ultra low friction mechanism of Carbon Nitride (CN x ) coatings under blowing dry Ar, thickness and area of transfer layers on mating surface were in-situ observed with an optical microscope during sliding against a sapphire hemisphere under blowing dry Ar. During sliding, thickness of transfer layer from CN x coating to a sapphire hemisphere increased and leaded to ultra low friction. When thickness and area of transfer layer was thick and small respectively, ultra low friction was observed. The result showed that the coefficient of friction decreased from 0.18 to 0.003 and remained constant throughout the friction test. It was confirmed the formation of a graphite-like transfer layer with Raman analysis and Auger Electron Spectroscopy (AES).

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Section: Effect Of the Thickness Of Transfer Layer On Friction Coeffimentioning

confidence: 99%

“…Where T c is the critical phase transition temperature of CN x (200°C) [8], ∆v is the difference between specific volume of low nitrogen content (0. ) [12], and ∆p is the difference between Herztian's contact pressure and atmospheric pressure.…”

Section: Effect Of the Thickness Of Transfer Layer On Friction Coeffimentioning

confidence: 99%

Effect of Transfer Layer on Ultra Low Friction of CNx Coating under Blowing Dry Ar

et al. 2013

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“…Absorption, structural and mechanical properties are the key factors to influence the laser induced damage resistance of the dielectric laser coatings. [4][5][6][7] So it is necessary to study the annealing effects on LIDT of laser coatings.…”

Section: Post-treatment By Annealingmentioning

confidence: 99%

Study of the Properties of Third Harmonic Beam Splitter

Zhang

Shang

Shao

et al. 2008

The Review of Laser Engineering

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The properties of third harmonic beam splitters for high power laser system were studied in this paper. The third harmonic beam splitter, which has high transmittance at 1053nm and 527nm, and high reflectance at 351nm, was designed using regular quarter-wavelength stacks. Considering the optical properties, electric field distributions and experimental results, we concluded the film stack of Glass/(HL) 12 3H2M2L/Air) was a better option for obtaining a third harmonic beam splitter with high laser induced damage threshold (LIDT). In this study, electron beam evaporation was employed to fabricate these beam splitters on fused silica substrates. The experimental results showed that the samples had good optical performance. The LIDT at 355nm is about 10J/cm 2 (355nm, 7ns). To understand the influence of post-treatment on the LIDT of the beam splitter, the as-deposited coatings were treated in vacuum chamber with oxygen plasma and annealed in clean ambient air, respectively. The result exhibited the LIDT at 355nm was increased with oxygen plasma treatment, while decreased after annealing in clean ambient air.

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“…The introduction of nitrogen into amorphous carbon film has several remarkable effects, such as the potential possibility to deposit b-C 3 N 4 , a material with expected buck modulus as high as diamond [3], and fullerenelike structures due to the formation of five-or sevenfold rings instead of sixfold p-bonded rings [4]. Until now, various types of DLC film can be deposited using different techniques such as magnetron sputtering [5,6], pulse laser deposition [7], filtered cathodic vacuum arc deposition [8,9], and plasma enhanced chemical vapor deposition (PECVD) [10]. The most popular laboratory deposition method is radio frequency (rf) PECVD [1].…”

Section: Introductionmentioning

confidence: 99%

Electrochemical corrosion behaviors of a-C:H and a-C:NX:H films

Wang

et al. 2008

Applied Surface Science

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The effect of annealing on the structure of cathodic arc deposited amorphous carbon nitride films

Cited by 44 publications

References 10 publications

Effect of Transfer Layer on Ultra Low Friction of CNx Coating under Blowing Dry Ar

Effect of Transfer Layer on Ultra Low Friction of CNx Coating under Blowing Dry Ar

Study of the Properties of Third Harmonic Beam Splitter

Electrochemical corrosion behaviors of a-C:H and a-C:NX:H films

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