The contribution of grain boundary scattering versus surface scattering to the resistivity of thin polycrystalline films

Marom, H.; Ritterband, M.; Eizenberg, M.

doi:10.1016/j.tsf.2005.12.155

Cited by 38 publications

(22 citation statements)

References 11 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…[1][2][3] Clearly for these applications, the nucleation and grain growth mechanism play an important role in predetermining the final electronic, optical, and even magnetic characteristics of an organic thin film. [4][5][6][7] The characteristic length scale of crystallites can vary in size from a few nm to a few m and are measured by scanning electron microscopy, transmission electron microscopy, x-ray diffraction, and atomic force microscopy ͑AFM͒. Furthermore, the grain orientation can be mapped using transverse shear microscopy as had been shown for ultrathin pentacene films.…”

Section: Introductionmentioning

confidence: 99%

Asymmetric grain distribution in phthalocyanine thin films

2009

View full text Add to dashboard Cite

Many electronic and optical properties of organic thin films depend on the precise morphology of grains. Iron phthalocyanine thin films are grown on sapphire substrates at different temperatures to study the effect of grain growth kinematics and to experimentally quantify the grain size distribution in organic thin films. The grain size is measured with an atomic force microscope and the data is processed and analyzed with wellknown image segmentation algorithms. For relevant statistics, over 3000 grains are evaluated for each sample. The data show pronounced asymmetric grain growth with increasing deposition temperature from almost spherical grains at room temperature to elongated needlelike shapes at 260°C. The average size along the major axis increases from 35 to 200 nm and along the minor axis from 25 to 90 nm. The distribution is almost symmetric at low-deposition temperatures, but becomes lognormal at higher temperatures. Strikingly, the major axis and minor axis of the elliptically shaped grains have different distributions at all temperatures due to the planar asymmetry of the molecule.

show abstract

Section: Introductionmentioning

confidence: 99%

Asymmetric grain distribution in phthalocyanine thin films

2009

View full text Add to dashboard Cite

show abstract

“…The resistivity values were normalized to the resistivity of the copper prior to the cap deposition, which was cm Ω µ 29 . 4 . The sheet resistance of the cap layer was neglected, being at least two orders of magnitude higher than that of the copper.…”

Section: Comparison With Other Cap Layersmentioning

confidence: 99%

“…In previous studies we investigated the roles of grain boundaries [4] and of surface roughness [5] in increasing the resistivity of nanometric copper structures. In this study we focus on the role of interfaces and try to understand whether they can alter the resistivity values.…”

Section: Introductionmentioning

confidence: 99%

<B>In-Situ Characterizarion of Interfaces-Induced Resistivity in Nanometric Dimensions</B>

Marom

Eizenberg

2006

MRS Proc.

View full text Add to dashboard Cite

To improve the speed of integrated circuits it is highly important to minimize the electrical resistivity of their interconnects. However, as the dimensions of the interconnects approach the mean free path of the electrons, a substantial rise in resistivity occurs due to additional electron scatterings from grain boundaries and interfaces. To investigate the role of interfaces, in-situ resistivity measurements were preformed for thin copper films on which different materials were deposited. The resistivity was monitored before and after the deposition, enabling to observe the changes as a new top interface was created. Among the materials tested, tantalum resulted in the highest resistivity increase. This fact is of special importance since this material and its nitride serve today as the common diffusion barrier for copper metallization. Titanium resulted in a smaller resistivity increase, but still higher than that of a free copper surface in vacuum. The developed approach enables to test the influence of different diffusion barriers on copper resistivity. With the continuously shrinking dimensions of copper interconnects, this factor will have an increasing importance in future technology nodes.

show abstract

“…Subsequently, Mayadas and Shatzkes (MS) [8], based on experimental observations, [9] studied the grain boundary scattering on electric resistivity by extending FS theory. As a basic problem of microscale energy transport, the size effects on the electric resistivity of metallic nanostructures have been widely studied [10][11][12][13][14][15][16][17]. Since the thermal conductivity of metals is closely related to their electric conductivity [5,18], the size effect on thermal responses of metals is also an important problem in the field of microscale energy transport.…”

Section: Introductionmentioning

confidence: 99%

Investigation of thermomechanical responses in ultrafast laser heating of metal nanofilms

Zhou

2011

Thin Solid Films

View full text Add to dashboard Cite

The present work uses two-temperature model and Cattaneo's constitutive model to study the thermomechanical responses and the size effect on energy transport during ultrafast laser heating of Au nanofilms. It is shown that the grain size effects on thermophysical properties, heat transport and thermal stresses are rather evident when the average grain diameter is less than the electron mean free path. The study on heat transport shows that there are two heat waves propagating in the lattice during nonequilibrium heating of films. It is found that the classical thermoelastic theory can not reveal the generation of the ultrafast thermal stresses during nonequilibrium heating; however, it can approximately describe the stress evolution in the stage of thermal equilibrium.

show abstract

The contribution of grain boundary scattering versus surface scattering to the resistivity of thin polycrystalline films

Cited by 38 publications

References 11 publications

Asymmetric grain distribution in phthalocyanine thin films

Asymmetric grain distribution in phthalocyanine thin films

<B>In-Situ Characterizarion of Interfaces-Induced Resistivity in Nanometric Dimensions</B>

Investigation of thermomechanical responses in ultrafast laser heating of metal nanofilms

Contact Info

Product

Resources

About