The continuous on-line monitoring of the trace elemental composition of industrial ethene gas by means of inductively coupled plasma mass spectrometry

Real-time multielement monitoring of airborne particulate matter using ICP-MS instrument equipped with gas converter apparatus

“…In order to elucidate the analytical feasibility of the gas converter/ICP-MS, the direct measurement of the Fe in clean room (class 1000) and outdoor air samples was performed. The signal intensity of Fe was measured at m/z 56, and cool plasma condition (condition 1 in Table 1) was used to minimize the spectral interference ( 40 Ar 16 O + on 56 Fe + ). The result is shown in Fig.…”

“…On-line and real-time analysis of aerosol samples using inductively coupled plasma atomic emission spectrometry (ICP-AES) and ICP-MS have been investigated by many researchers. [15][16][17][18][19][20][21][22][23][24][25][26] Clarkson et al have developed an analytical system for the continuous measurement of metal concentrations in flue gas by ICP-AES. 17 However, the detection capability for heavy metals is at sub mm À3 to mg m À3 levels, [17][18][19][20] which is insufficient for monitoring heavy metals in ambient air.…”

Mass Spectrometric Techniques for Analysis of Gaseous Materials and Volatile Compounds

“…For example, the determination of trace metal impurities in ethylene gas for real time continuous online process control by ICP-MS has been applied in the polymer industry by Klinkenberg et al 14 Trace impurities in high purity gases used, for example, in semiconductor manufacturing, can be determined by the impinger sampling method or after particle filter sampling by ICP-MS. 15 Whereas the impinger method is applied for the determination of metal impurities in CO gas, 16 for the impurity analysis of silane the particles are trapped on the surface of a Teflon membrane filter of 0 1 m pore size. For example, the determination of trace metal impurities in ethylene gas for real time continuous online process control by ICP-MS has been applied in the polymer industry by Klinkenberg et al 14 Trace impurities in high purity gases used, for example, in semiconductor manufacturing, can be determined by the impinger sampling method or after particle filter sampling by ICP-MS. 15 Whereas the impinger method is applied for the determination of metal impurities in CO gas, 16 for the impurity analysis of silane the particles are trapped on the surface of a Teflon membrane filter of 0 1 m pore size.…”

Direct introduction of cigarette smoke for puff-by-puff trace metals analysis by inductively coupled plasma mass spectrometry

“…For example, the determination of non-metals, such as Br, C, Cl, F, and S, in gaseous samples has been performed by ICP-OES. [19][20][21] Real-time monitoring and determination of trace metals for continuous on-line process control have also been applied to the polymer industry for analysis of inorganic impurities in ethene gas by ICP-MS. 22 Electronic grade gases utilized for the semiconductor manufacturing process have been introduced to sealed ICP-OES 23,24 and ICP-MS 25 instruments for ultra-trace level impurity measurements.…”