The composition, structure and surface properties of the titanium-carbon coatings prepared by PVD technique

Rubshtein, A. P.; Vladimirov, A. B.; Korkh, Yu. V.; Ponosov, Yu. S.; Плотников, С.А.

doi:10.1016/j.surfcoat.2016.11.020

Cited by 36 publications

(14 citation statements)

References 37 publications

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“…This technique has suffered relevant improvements, mainly in carbides and nanocomposite transition metal nitrides substrates [8][9][10][11][12]. Research has been focused on improving the characteristics of coatings, although the enhancement of the deposition rate effectiveness regarding this process has been the main concern of the industry linked to this kind of techniques [13][14][15].…”

Section: Introductionmentioning

confidence: 99%

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand.

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Section: Introductionmentioning

confidence: 99%

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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“…A discussion about amorphous carbon and titanium-carbon nanocomposite (TiCx/a-C) coatings deposited by PVD method is given in reference [5]. In this case TiCx/a-C is obtained by simultaneous sputtering of grafite and titanium targets using arc pulse and arc sputtering respectivelly.…”

Section: Introductionmentioning

confidence: 99%

NANOSTRUCTURED Ti-C THIN FILMS DEPOSITED BY THERMIONIC VACUUM ARC (TVA) TECHNOLOGY

CIUPINA¹,

Vladoiu²,

Lungu³

et al. 2022

AnnalsARSciPhysChem

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Nanostructured titanium-carbon nanostructured thin films were prepared using the Thermionic Vacuum Arc (TVA) technology in different configurations under a varied number of Ti/C combinations at high base pressure of 1 x 10-6Torr with and without graded compositions. The layers consisting of about lOOnm Carbon base layer and seven 40nm alternatively Ti and C layers were deposited on Silicon substrates. On the other hand, in order to obtain C-Ti multilayer structures with variable thickness and different percentages in C and Ti oflayers, a 20nm thick C layer was first deposed on Si substrate and then seven Ti-C layers, each ofthese having thickness of up to 40nm were deposed. To perform the successively layers with various thickness were changed the discharge parameters for C and Ti plasma sources to obtain the desirable thickness. By changing ofsubstrate temperature between room temperature and 300°C and on the other hand the bias voltage up to -700V, different batches of samples were obtained for this study. The films were characterized by surface morphology, and microstructure, through Rutherford Backscattering Spectrometry (RBS), Raman Spectroscopy, Transmission Electron Microscopy (TEM), Grazing Incidence X-ray diffraction (GIXRD). Tribological and electrical measurements are also presented.

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“…DLC (diamond-like carbon) coatings are also becoming more and more popular, which are especially used in the machining of aluminum. They prevent the adhesion of the machined material to the tool, and moreover, they are characterized by high hardness, chemical stability and thermal conductivity, lower friction coefficient, and lower machined surface roughness [32,33].…”

Section: Introductionmentioning

confidence: 99%

Formation of Surface Topography During Turning of AISI 1045 Steel Considering the Type of Cutting Edge Coating

Szczotkarz¹,

Maruda²,

Dębowski³

et al. 2021

Adv. Sci. Technol. Res. J.

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The composition, structure and surface properties of the titanium-carbon coatings prepared by PVD technique

Cited by 36 publications

References 37 publications

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

NANOSTRUCTURED Ti-C THIN FILMS DEPOSITED BY THERMIONIC VACUUM ARC (TVA) TECHNOLOGY

Formation of Surface Topography During Turning of AISI 1045 Steel Considering the Type of Cutting Edge Coating

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