1991
DOI: 10.1070/rc1991v060n09abeh001122
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The chemistry of processes which create dielectric layers with functional group substituents on semiconductors by impurity thermo-oxidation

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Cited by 4 publications
(2 citation statements)
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“…These components can occur in the form of compounds with the deposited metals (the presence of the MeAs compounds at the inner Me/GaAs interface according to the X-ray diffraction and IR spectroscopic data). In the general case, the stage of these interactions is the controlling stage for oxidation processes in complex semiconductors of the A II B V types with the participation of different activators [47]. A comparison of the processes under investigation with the oxidation of the gallium arsenide itself demonstrates that gallium has a higher oxidizing ability than arsenic and the following reactions proceed in the system:…”
Section: Physicochemical Features Of the Interactions Between Metal Nmentioning
confidence: 99%
“…These components can occur in the form of compounds with the deposited metals (the presence of the MeAs compounds at the inner Me/GaAs interface according to the X-ray diffraction and IR spectroscopic data). In the general case, the stage of these interactions is the controlling stage for oxidation processes in complex semiconductors of the A II B V types with the participation of different activators [47]. A comparison of the processes under investigation with the oxidation of the gallium arsenide itself demonstrates that gallium has a higher oxidizing ability than arsenic and the following reactions proceed in the system:…”
Section: Physicochemical Features Of the Interactions Between Metal Nmentioning
confidence: 99%
“…As it is practically impossible to use the higher oxide Mn 2 O 7 for the experiment due to its extremely fast decomposition, the study is based on compositions of MnO 2 with p-block oxides (PbO) and d-block oxides (V 2 O 5 ). The individual chemostimulating effects of these oxides have already been studied [6,7].…”
Section: Introductionmentioning
confidence: 99%