The Characterization of KrF Photoresists and the Effect of Different Ultraviolet (UV) Absorption Rates on Line Edge Roughness (LER) for Submicron Technology

Bakri, A.; Manaf, Mohd Jeffery; Wahab, Kader Ibrahim Abdul; Ahmad, M.I. Bin

doi:10.1109/iemt.2006.4456488

2006 Thirty-First IEEE/CPMT International Electronics Manufacturing Technology Symposium

2006

DOI: 10.1109/iemt.2006.4456488

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The Characterization of KrF Photoresists and the Effect of Different Ultraviolet (UV) Absorption Rates on Line Edge Roughness (LER) for Submicron Technology

A. Bakri¹,

Mohd Jeffery Manaf²,

Kader Ibrahim Abdul Wahab³

et al.

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The Characterization of KrF Photoresists and the Effect of Different Ultraviolet (UV) Absorption Rates on Line Edge Roughness (LER) for Submicron Technology

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