The catalytic decomposition of CF4 over Ce/Al2O3 modified by a cerium sulfate precursor

Experimental and simulation studies for reaction enhancement of catalytic CF4 hydrolysis by consecutive HF removal using a multi‐stage catalyst‐adsorbent reactor

“…BET analysis shows that surface area of the P/γ‐Al 2 O 3 catalyst was reduced slightly from 170 to 156 m 2 g −1 after reaction (Table ). The XRD patterns in Figs (c) and 5(d) show that catalysts before and after reaction had a γ‐alumina phase in its entirety and there was no evidence of phase deformation like AlF 3 formation, too . From the SEM/EDX, BET, and XRD analysis, it can be concluded that these results are corroborative facts of our P/γ‐Al 2 O 3 catalyst in the previous paper for use in this multi‐stage catalyst‐adsorbent reactor and the change in the catalyst before and after reaction is insignificant in the multi‐stage catalyst‐adsorbent reactor for CF 4 hydrolysis reaction.…”

Catalytic hydrolysis of trifluoromethane over alumina

“…7, the XRD patterns of fresh and spent α-Al 2 O 3 are almost identical, and no formation of AlF 3 is detected. 35 Under high concentration of water vapor, aft er losing part of OH, some of Al remains un-fl uorinated. It further confi rms that the hydrolysis of CHF 3 is majorly determined by the surface hydroxyl group.…”

“…Th e similar phenomenon was also reported during the hydrolysis of CF 4 over Ce/Al 2 O 3 catalyst. 35 Under high concentration of water vapor, aft er losing part of OH, some of Al remains un-fl uorinated. In the prolonged TOS and at high temperatures, these Al transform to α-Al 2 O 3 instead of AlF 3 despite the presence of HF and other fl uorine containing species.…”

Conceptual design of a new SF6 abatement technology using a multi‐bed series reactor for the production of valuable chemicals free of toxic wastes

“…With strict environmental regulations and efforts to reduce global warming, perfluorinated compounds (PFCs) such as CF 4 [1][2][3], CHF 3 [4,5], C 2 F 6 [6,7], C 3 F 8 [8], and SF 6 [9][10][11][12][13][14][15][16][17][18][19], which are commonly used as etching and cleaning gases in the semiconductor manufacturing, have globally attracted significant attention because they are toxic chemicals and potential contributors to the global warming as greenhouse gases (GHGs) [2,3,9,20,21]. PFCs have relatively high global warming potential (GWP) ranging from 6,500 to 23,900 compared to conventional CO 2 with a GWP value of 1 [21][22][23] and among them, SF 6 with a GWP value of 23,900 has been identified as the strongest due to its intensive absorption of infrared radiation and long atmospheric lifetime [10-12, 19, 20, 24, 25].…”