Abstract:Features of thermally stimulated charge release (TSCR) currents from centers in the transition layer of the SiSiO2 interface in the temperature range from 6 to 20 K are investigated. It is shown that for a correct determination of the shallow acceptor center density in the n‐type semiconductor one should control injection abilities of the substrate contact. Filling of the acceptor states in the interface should be performed at proper temperatures when hole injection into the semiconductor bulk takes place. Di… Show more
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