2002
DOI: 10.1055/s-2002-35231
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The 2-(Trimethylsilyl)ethyl Sulfur Group in Synthesis

Abstract: The trimethylsilylethyl sulfur group present in 2-(trimethylsilyl)ethyl sulfides, sulfones, sulfoxides and in 2-(trimethylsilyl)ethylsulfonamido derivatives has proved its potential in synthesis. Presence of sulfur and silicon on adjacent carbon atoms provides routes for preparing interesting sulfur or non-sulfur, silicon or non-silicon derivatives like thiols, methyl disulfides, thioesters, thiocyanates, unsaturated derivatives and amines through the selective removal of the trimethylsilylethyl or the trimeth… Show more

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Cited by 3 publications
(1 citation statement)
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References 93 publications
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“…The last step in the oligonucleotide synthesis involved the deprotection of the amine group using ammonium hydroxide at 55 °C. The Fmoc protecting group of oligonucleotide ON1 was removed, however, the cyanoethyl group as a base-labile protecting group of the thiol was not removed quantitatively from the oligonucleotide ON2 [5458]. …”
Section: Resultsmentioning
confidence: 99%
“…The last step in the oligonucleotide synthesis involved the deprotection of the amine group using ammonium hydroxide at 55 °C. The Fmoc protecting group of oligonucleotide ON1 was removed, however, the cyanoethyl group as a base-labile protecting group of the thiol was not removed quantitatively from the oligonucleotide ON2 [5458]. …”
Section: Resultsmentioning
confidence: 99%