2004
DOI: 10.1016/j.solener.2003.08.019
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Texturing industrial multicrystalline silicon solar cells

Abstract: Three potential techniques for texturing commercial multicrystalline silicon solar cells are compared on the basis of reflectance measurements. Wet acidic texturing, which would be the least costly to implement, produces a modest improvement in reflection before antirflection coating and encapsulation, whereas maskless reactiveion etching texturing, and especially masked reactive-ion etched 'pyramids', generate a larger gain in absorption. After antireflection coating and encapsulation however, the differences… Show more

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Cited by 252 publications
(119 citation statements)
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“…[38][39][40][41] For large area photovoltaic applications, light trapping strategies that involve little or no micro-or nanofabrication and patterning are desirable to improve performance while minimizing cost. [42][43] An interesting strategy towards this end is the use of thin film interference. Figures 2b and 2d show two common strategies for lithography-free absorption enhancement in ultrathin semiconductor films.…”
Section: Absorption and Photonic Designmentioning
confidence: 99%
“…[38][39][40][41] For large area photovoltaic applications, light trapping strategies that involve little or no micro-or nanofabrication and patterning are desirable to improve performance while minimizing cost. [42][43] An interesting strategy towards this end is the use of thin film interference. Figures 2b and 2d show two common strategies for lithography-free absorption enhancement in ultrathin semiconductor films.…”
Section: Absorption and Photonic Designmentioning
confidence: 99%
“…4 Alkaline etching may also be used for multicrystalline Si, but due to the random orientation of the crystal grains, isotropic acidic etching that results in a random dimple-like pattern is a more common approach. 5 Pyramidal structures have been demonstrated on crystalline Si solar cells with thickness in the 30 micron range 6 despite structure sizes with a depth of more than 10 lm. These structures have excellent anti-reflection properties, but better light confinement may be achieved with other structures.…”
Section: Introductionmentioning
confidence: 99%
“…Especially for the isotexture, the etching process has to start at nucleation points so that no planar surface results (as a result of a homogeneous etching). A simplified process for the effective texturing of multicrystalline silicon using acidic etching processes is based on using saw damages on wafers as seeding or nucleation, in this way a homogeneously distributed texture can be achieved [40,71]. Figure 3.8 shows two photographs of multicrystalline silicon wafers, one textured using an alkaline solution, the other using an acidic solution.…”
Section: Overview Of Etching Technologies (Maskless)mentioning
confidence: 99%