Texture and Magnetism of Nanocrystalline Ni Films and Multilayers

Abstract

Nickel films are grown by radio frequency magnetron sputtering on Corning glass, polyimide foils and on the native oxide of Si (100) wafers at low (1x10-3 mbar) and relatively high (2.5x10-2 mbar) Argon pressure at 100 °C. The base pressure of the high vacuum chamber is 1x10-7 mbar. X-ray diffraction experiments are performed to reveal the different texture of various Ni films. Magneto-optical Kerr effect hysteresis loops and magnetic force microscopy images show correlation between Argon pressure, texture and magnetic anisotropy of the films. The results are discussed with respect to relevant measurements of Ni/NiO magnetic multilayers prepared under similar experimental conditions.

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

“…The dcMS deposition rate is roughly two times that of the HiPIMS rate for the same tilt angles. This is a somewhat lower deposition rate than has been reported for rf magnetron sputtering of Ni in the past [20–21], which might be due to rather long distance between target and substrate (25 cm) in this experiment. In terms of surface roughness, the HiPIMS-deposited film shows 0.8 nm roughness while the dcMS-deposited film shows 1.9 nm for normal deposition.…”

“…The magnetic properties of evaporated [10–11], electrodeposited [12–15], chemical-vapor-deposited [16], and dc [17–19] and rf [20–22] magnetron sputtered thin nickel films have been studied for almost ten decades. This has included studies of the magnetic properties while varying film thickness [10,20], grain size, substrate material [11,21] and substrate temperature [19], as well as while stacking into superlattices [23–24].…”

Insights into Electronucleation and Electrodeposition of Nickel from a Non-aqueous Solvent Based on NiCl2·6H2O Dissolved in Ethylene Glycol

“…The shape of the MH curve, high saturation field, and coercivities achieved in Figure a,b (i.e., M s = 3.450 emu g –1 , M R = 0.198 emu g –1 , and H c = 11.101 kA m –1 ) indicate that the Ni film is magnetized along a hard direction, which implies that the easy magnetic direction (⟨111⟩) must align along the direction perpendicular to the sample plane. This effect is known as the perpendicular magnetic anisotropy effect, which is often observed in a thin film with multilayers. , On the other hand, the Ni (bulk) sample with longer deposition time (red curve) induces a change (more rectangle) in the shape of the hysteresis loop, but it saturates at nearly the same applied field, H , with the sample obtained by a shorter electrodeposition time (olive curve). A similar behavior can be observed with the magnetic curves measured for Ni electrodeposition from different Ni­(II) concentrations (Figure c) and temperatures (Figure d).…”

“…A similar behavior can be observed with the magnetic curves measured for Ni electrodeposition from different Ni­(II) concentrations (Figure c) and temperatures (Figure d). The observed difference in the shape of the hysteresis loop between the Ni thin film and bulk samples can be explained due to the presence of additional texture components in a significant volume fraction (i.e., {200} crystallographic orientations, see the red curve of Figure d where the (200) diffraction peak exhibits a high intensity), which require a specialized technique to confirm such as the X-ray macrotexure . This could be an interesting issue for future studies.…”

“…This effect is known as the perpendicular magnetic anisotropy effect, which is often observed in a thin film with multilayers. 53,54 On the other hand, the Ni (bulk) sample with longer deposition time (red curve) induces a change (more rectangle) in the shape of the hysteresis loop, but it saturates at nearly the same applied field, H, with the sample obtained by a shorter electrodeposition time (olive curve). A similar behavior can be observed with the magnetic curves measured for Ni electrodeposition from different Ni(II) concentrations (Figure 12c) and temperatures (Figure 12d).…”