1982
DOI: 10.1109/tr.1982.5221212
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Testing for MOS IC Failure Modes

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1983
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Cited by 32 publications
(4 citation statements)
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“…100% relative humidity). From a review of this literature, the failure modes dependent on moisture and ionic contamination are bond pad corrosion [20,[60][61][62] and MOSFET threshold voltage shifts, which may be caused by damage to the gate oxide from ionic contamination or water-enhanced charged-carrier injection [63][64][65][66].…”
Section: Current and Future Ageing Testsmentioning
confidence: 99%
“…100% relative humidity). From a review of this literature, the failure modes dependent on moisture and ionic contamination are bond pad corrosion [20,[60][61][62] and MOSFET threshold voltage shifts, which may be caused by damage to the gate oxide from ionic contamination or water-enhanced charged-carrier injection [63][64][65][66].…”
Section: Current and Future Ageing Testsmentioning
confidence: 99%
“…The steady-state condition (dr/dt = 0) is assumed to be reached when power dissipated in the filament is at a maximum -that is, when Rf Surface-charge spreading, largely observed in MOS and memory devices, involves the lateral spreading of ionic charge from the biased metal conductors, along the oxide layer or through moisture on the device surface [Edwards 1982, Blanks 1980, Stojadinovic 1983]. An inversion layer outside the active region of the transistor is formed due to the charge, creating a conduction path between the two diffused regions or extending the p-n junction through a high-leakage region, resulting in leakage currents between neighboring conductors.…”
mentioning
confidence: 99%
“…Die Forderung der Erfassung von Leitungsunterbrechungen resultiert aus der verwendeten CMOS-Technologie, bei der diese Fehlerart eine große Rolle spielt[8,9]. Die Gesamtschaltung wurde als CMOS-Gate Array unter Verwendung von 940 Makrozellen bzw.…”
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