2013
DOI: 10.1002/adom.201300021
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Terahertz Localized Surface Plasmon Resonances in Coaxial Microcavities

Abstract: Coaxial microcavities etched into the surface of a doped silicon substrate are shown to support localized surface plasmon resonances at terahertz frequencies. The underlying mechanism involves coupling freely propagating terahertz waves with surface plasmon polaritons (SPPs), which propagate in a coaxial mode along the cavity walls in the axial direction. A Fabry–Pérot resonance is built up when the SPP wavenumber appropriately relates to the cavity depth. Owing to the Ohmic loss of the silicon at terahertz fr… Show more

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Cited by 24 publications
(29 citation statements)
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References 37 publications
(39 reference statements)
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“…For the coaxial cavity, the fundamental cavity mode needs to satisfy the standing-wave condition 2dβ′ = 0.9π, or β′ = 23562 rad/m. 20 It is noted that the 0.9π rad accounts for a reflection phase change at the bottom of the cavity, observed numerically. From Figure 4, this wavenumber corresponds to the frequency of 1.2 THz, in good agreement with the resonance frequency observed from the experimental and numerical results.…”
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confidence: 82%
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“…For the coaxial cavity, the fundamental cavity mode needs to satisfy the standing-wave condition 2dβ′ = 0.9π, or β′ = 23562 rad/m. 20 It is noted that the 0.9π rad accounts for a reflection phase change at the bottom of the cavity, observed numerically. From Figure 4, this wavenumber corresponds to the frequency of 1.2 THz, in good agreement with the resonance frequency observed from the experimental and numerical results.…”
mentioning
confidence: 82%
“…The design is inspired by our earlier demonstration of complementary plasmonic resonators in the form of annular cavities etched into the surface of a doped silicon wafer. 20 These resonant cavities exhibit relatively strong nonradiative damping, …”
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confidence: 99%
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“…The latter two parameters are determined by the carrier concentration and mobility of the doped silicon, which can be obtained through either Hall Effect analysis 25 or THz reflection spectroscopy. 30 Here we choose ω p = 2π × 5.22 THz and γ = 2π × 1.32 THz in our following structure design since doped silicon with these parameters had already been realized in reference. 25 The structure of our absorber are schematically shown in Fig.…”
Section: The Performance Of Sawtooth-shaped Absorbermentioning
confidence: 99%