2020
DOI: 10.1016/j.apsusc.2020.145578
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Temperature evolution of the magnetic properties of Ag/Fe nanodot arrays

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Cited by 6 publications
(4 citation statements)
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“…Samples of 50-nm-thick Co thin films were deposited on thermally oxidized silicon wafer substrates by ionbeam-assisted deposition [34]. During deposition, a Kaufmann ion source operating at 800 V and 7.5 mA was used to sputter the Co target.…”
Section: Methodsmentioning
confidence: 99%
“…Samples of 50-nm-thick Co thin films were deposited on thermally oxidized silicon wafer substrates by ionbeam-assisted deposition [34]. During deposition, a Kaufmann ion source operating at 800 V and 7.5 mA was used to sputter the Co target.…”
Section: Methodsmentioning
confidence: 99%
“…Samples of 50-nm-thick Co thin films were deposited on thermally oxidized silicon wafer substrates by ionbeam-assisted deposition (IBAD) [30]. During deposition, a Kaufmann ion source operating at 800 V and 7.5 mA was used to sputter the Co target.…”
Section: Methodsmentioning
confidence: 99%
“…In this case, the resonance equation takes the same form as illustrated in Eq. (30). We can now rewrite this equation in the form:…”
Section: Field-and Frequency Dependence Of the Modesmentioning
confidence: 99%
“…Samples of 50 nm thick Co thin films were deposited on thermally oxidized silicon wafer substrates by Ion Beam Assisted Deposition (IBAD) [27]. During deposition, a Kaufmann ion source operating at 800 V and 7.5 mA was used to sputter the Co target.…”
Section: Co/ag Bilayers and Nanodotsmentioning
confidence: 99%