2014
DOI: 10.1149/06414.0125ecst
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Temperature Effect on Memory Functions of the nc-CdSe Embedded ZrHfO High-k MOS Device

Abstract: The temperature effect on the memory characteristics of the MOS capacitor containing the nanocrystalline CdSe embedded ZrHfO high-k gate dielectric has been investigated. At the high temperature, the Coulomb blockade phenomenon is suppressed and the leakage current is increased due to the relative high conductivity of the dielectric film. At the same time, the density of interface states is high and the memory window is small. When the temperature is increased, the hole trapping capacity is enhanced because of… Show more

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Cited by 6 publications
(20 citation statements)
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“…The shift in the backward sweep direction is larger than that in the forward sweep direction, which results in a small reduction of both V FB and Q. This phenomenon can be explained by the competitive trapping and retention of holes and electrons in the highk stack, 22 which will be discussed in detail later. Separately, the inset of Fig.…”
Section: Resultsmentioning
confidence: 94%
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“…The shift in the backward sweep direction is larger than that in the forward sweep direction, which results in a small reduction of both V FB and Q. This phenomenon can be explained by the competitive trapping and retention of holes and electrons in the highk stack, 22 which will be discussed in detail later. Separately, the inset of Fig.…”
Section: Resultsmentioning
confidence: 94%
“…22,24 On the other hand, under the +6 V to −6 V sweep condition, the magnitude of the positive V FB shift decreases from 0.49 V at 20…”
Section: Resultsmentioning
confidence: 97%
See 3 more Smart Citations