2010
DOI: 10.1021/la904604z
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Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers

Abstract: Nucleation and subsequent growth of aluminum oxide by atomic layer deposition (ALD) on polypropylene fiber substrates is strongly dependent on processing temperature and polymer backbone structure. Deposition on cellulose cotton, which contains ample hydroxyl sites for ALD nucleation and growth on the polymer backbone, readily produces a uniform and conformal coating. However, similar ALD processing on polypropylene, which contains no readily available active sites for growth initiation, results in a graded an… Show more

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Cited by 141 publications
(149 citation statements)
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References 35 publications
(52 reference statements)
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“…36 At higher temperatures, enhanced diffusion leads to surface roughening that is not observed for coatings formed at lower temperatures ( Figure 5 ). 35 Pulsed or sequential vapor infi ltration can also completely saturate the bulk/precursor reaction, yielding full chemical modifi cation of the starting polymer. After exposing polybutylene terephthalate microfi bers to TMA and H 2 O for 18 hours and 1 hour, respectively, at 80°C, mass uptake and infrared transmission data indicated that the starting polymer was completely converted to a hybrid organic-inorganic solid, as shown in Figure 6 .…”
Section: Pulsed Vapor Infi Ltration and Sequential Vapor Infi Ltrationmentioning
confidence: 99%
“…36 At higher temperatures, enhanced diffusion leads to surface roughening that is not observed for coatings formed at lower temperatures ( Figure 5 ). 35 Pulsed or sequential vapor infi ltration can also completely saturate the bulk/precursor reaction, yielding full chemical modifi cation of the starting polymer. After exposing polybutylene terephthalate microfi bers to TMA and H 2 O for 18 hours and 1 hour, respectively, at 80°C, mass uptake and infrared transmission data indicated that the starting polymer was completely converted to a hybrid organic-inorganic solid, as shown in Figure 6 .…”
Section: Pulsed Vapor Infi Ltration and Sequential Vapor Infi Ltrationmentioning
confidence: 99%
“…In particular, textile electronics using the ALD is one of the promising fields since several materials can be readily deposited at temperatures lower than 150°C by ALD, leading to the effective functionalization of thermally fragile substrates such as plastics, cellulose papers and polymeric textiles. [9][10][11][12] Chen et al 13 demonstrated hydrophobic silk fabrics with a high laundering durability and robustness due to a TiO 2 coating deposited by ALD. However, in the case of metal ALD, since temperatures as high as 300°C are generally required to achieve successful deposition with the thermal energy of the precursor reactions, it is difficult to deposit conformal metal films onto thermally weak substrates using ALD, causing difficulties in a wide range of applications, including textile electronics.…”
Section: Introductionmentioning
confidence: 99%
“…Al 2 O 3 , ZrO 2 , TiO 2 and so on) have been investigated on various types of polymer substrates during the ALD process [18][19][20][21][22][23][24][25]. A model was proposed for the ALD precursors' adsorption on surface and diffusion into the subsurface of polymers without active groups [19], and it was found that the process temperature significantly affected the interface between the deposition layer and the substrate [26,27]. There are some reports on the deposition of metal oxides by ALD on PP substrates but most studies are focused on the deposition of metal oxides, mainly Al 2 O 3 , on nonporous PP films [19,[27][28][29][30].…”
Section: Introductionmentioning
confidence: 99%