Two-dimensional (2D) materials containing hole defects are a promising substitute for conventional nanopore membranes like silicon nitride. Hole defects on 2D materials, as atomically thin nanopores, have been used in nanopore devices, such as DNA sensor, gas sensor and purifier at lab-scale. For practical applications of 2D materials to nanopore devices, researches on characteristics of hole defects on graphene, hexagonal boron nitride and molybdenum disulfide have been conducted precisely using transmission electron microscope. Here, we summarized formation, features, structural preference and stability of hole defects on 2D materials with atomic-resolution transmission electron microscope images and theoretical calculations, emphasizing the future challenges in controlling the edge structures and stabilization of hole defects. Exploring the properties at the local structure of hole defects through in situ experiments is also the important issue for the fabrication of realistic 2D nanopore devices.Key Words: Two-dimensional materials, Hole defect, Nanopore, Transmission electron microscope, Defect structure Park HJ et al.
108consists of mono element of carbon, but hBN contains two elements of boron (B) and nitrogen (N) alternatively in plane, and each molybdenum and sulfur in MoS 2 are bound to each other with a ratio of 1:2 in a trigonal prism unit cell wherein Mo layer is sandwiched between sulfur layers (Fig. 1). Each material has its own composition, thus, it shows all different features such as formation process, edge structure, stability and consequential properties of hole defects on graphene, hBN, and MoS 2 , which are described below. Among various methods to make holes on 2D materials (Bieri et al., 2009; Girit et al., 2009; Bai et al., 2010;Kim et al., 2010;Koenig et al., 2012;Russo & Golovchenko, 2012), electron beam in transmission electron microscope (TEM) is good at size control at atomic scale, which is the most important issue for the sensitivity and selectivity of nanopore devices. If electron beam irradiation on a 2D specimen with a high electron energy breaks the atomic bonds within the material, which is called knock-on voltage, atoms are ejected from the lattice leaving holes on the materials. The atom displacement, knock-on thresholds and other structural information of graphene (Smith & Luzzi, 2001), hBN (Kotakoski et al., 2010), and MoS 2 (Komsa et al., 2012) are summarized in Table 1. Fig. 2A shows the hole defects of graphene by the electron beam irradiation at 80 kV. To make hole defects in graphene, over 86 kV of electron beam energy, the knock-on threshold voltage of graphene, needs to be irradiated on the sample. But some studies showed the existence of oxygen or other chemicals on the sheet or inside TEM chamber can lower the knock-on threshold of graphene by chemical etching effect . Inherent defects created from the synthesizing process of graphene also lower the knockon threshold voltage (Crespi et al., 1996). Once a vacancy is formed, it continuously grows as electron beam ...