Tw o-dimensional boron materials have recently attracted extensive theoretical interest because of their exceptional structural complexity and remarkable physical and chemical properties.H owever,s uch 2D boron monolayers have still not been synthesized. In this report, the synthesis of atomically thin 2D g-boron films on copper foils is achieved by chemical vapor deposition using amixture of pure boron and boron oxide powders as the boron source and hydrogen gas as the carrier gas.S trikingly,t he optical band gap of the boron film was measured to be around 2.25 eV,w hich is close to the value (2.07 eV) determined by first-principles calculations, suggesting that the g-B 28 monolayer is afascinating direct band gap semiconductor.Furthermore,astrong photoluminescence emission band was observed at approximately 626 nm, which is again due to the direct band gap.This study could pave the way for applications of two-dimensional boron materials in electronic and photonic devices.Two-dimensional (2D) materials are attractive components of atomic-layer field-effect transistors (FETs), sensors,a nd photovoltaic and photoelectric devices. [1][2][3][4][5] Although graphene has been shown to be au seful material for highperformance electronics owing to its very high carrier mobility,i ts uffers from the lack of as ignificant band gap, which limits its application in digital electronics. [3][4][5] Hence, three-atom-thick 2D semiconducting transition-metal dichalcogenides (TMDs;e .g., MoS 2 ,W S 2 ,M oSe 2 ,W Se 2 )a nd oneatom-thick non-metal/metal layers with ah oneycomb structure (e.g., silicene,g ermanene,p hosphorene,a rsenene,a ntimonene,a nd stannene) have attracted wide interest. [3][4][5][6][7]