Temperature Dependence of Ag Film Roughening during Deposition on Quasicrystal and Approximant Surfaces

Abstract

The temperature (T ) dependence of roughening as assessed by scanning tunneling microscopy is compared for growth of Ag lms on an 5-fold icosahedral AlPdMn quasicrystal surface and on an ξ -approximant. Growth on the quasicrystal corresponds to a version of the VolmerWeber growth, but modied by quantum size eects, and also by kinetic smoothening at low T and low coverages (θ). Growth on the approximant corresponds to a version of the StranskiKrastanov growth modied by kinetic roughening at low T and low θ. For larger θ, i.e., for thicker lms, distinct behavior is observed.

Quantum size effects in Ag thin films grown on the fivefold surface of the icosahedral Al-Cu-Fe quasicrystal: Influence of the growth temperature

“…54 The root-mean-square roughness deduced from STM images at 1 ML coverage increases with the deposition temperature and takes values similar to those reported for Ag/i-Al-Pd-Mn. 73 Height histograms show that 3 ML high islands are more frequent after deposition at 400 K compared to 57 K, indicating that easy uphill motion of Ag adatoms is facilitated at higher temperatures. 48,49 For 1 ML Ag/i-Al-Pd-Mn at 365 K, it has been found that specific height (4-5 ML) flat-topped islands are preferred compared to other heights (1, 2, and 3 ML).…”