1973
DOI: 10.1016/0032-3950(73)90474-7
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Temperature conditions of etching polymers in the high-frequency oxygen discharge plasma

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“…For this purpose, we used the E306A (Edwards Coating System, USA) vacuum chamber and the technique described in ref. . The discharge source was a high frequency self‐generating short‐wave generator with 100 W capacity.…”
Section: Methodsmentioning
confidence: 99%
“…For this purpose, we used the E306A (Edwards Coating System, USA) vacuum chamber and the technique described in ref. . The discharge source was a high frequency self‐generating short‐wave generator with 100 W capacity.…”
Section: Methodsmentioning
confidence: 99%