2015
DOI: 10.1016/j.tca.2014.12.017
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Temperature calibration procedure for thin film substrates for thermo-ellipsometric analysis using melting point standards

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Cited by 12 publications
(10 citation statements)
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“…The excess free volume (EFV) and glass transition temperature (T g ) were measured using temperature-dependent spectroscopic ellipsometry analysis (TEA) on an M2000-X ellipsometer (J.A. Woollam Co.) equipped with a temperature-controlled hot-stage (HCS622, INSTEC), the temperature was calibrated using melting point standards [60]. The spectroscopic ellipsometry measurements were conducted in the full wavelength range of 370-1000 nm.…”
Section: Layer Preparationmentioning
confidence: 99%
“…The excess free volume (EFV) and glass transition temperature (T g ) were measured using temperature-dependent spectroscopic ellipsometry analysis (TEA) on an M2000-X ellipsometer (J.A. Woollam Co.) equipped with a temperature-controlled hot-stage (HCS622, INSTEC), the temperature was calibrated using melting point standards [60]. The spectroscopic ellipsometry measurements were conducted in the full wavelength range of 370-1000 nm.…”
Section: Layer Preparationmentioning
confidence: 99%
“…Temperature calibration was performed using melting point standards. [23] Measurements were performed at a 708 angle of incidence. During experiments, the hot stage was continuously purged with nitrogen.…”
Section: Ellipsometrymentioning
confidence: 99%
“…During the experiments, the hot stage was continuously purged with ultrapure N 2 . Temperature calibration was done using melting standards …”
Section: Methodsmentioning
confidence: 99%