2018
DOI: 10.1002/pssr.201800216
|View full text |Cite
|
Sign up to set email alerts
|

Temperature and Electric Field Dependence of Spin Relaxation in Graphene on SrTiO3

Abstract: The theoretically predicted intrinsic spin relaxation time of up to 1 μs in graphene along with extremely high mobilities makes it a promising material in spintronics. Numerous experimental studies, however, find the spin lifetime in graphene to be several orders of magnitude below that theoretically predicted. Additionally, analyses of the spin relaxation mechanisms in graphene using conventional processes such as Elliot-Yaffet and D'yakonov-Perel' show a coexistence of both, with no clear dominance. Central … Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
11
0

Year Published

2018
2018
2021
2021

Publication Types

Select...
5
1

Relationship

1
5

Authors

Journals

citations
Cited by 11 publications
(12 citation statements)
references
References 41 publications
(110 reference statements)
0
11
0
Order By: Relevance
“…SOC is a relativistic interaction that in atomic systems has a degree of smallness described by the fine structure constant, 𝛼𝛼 ≈ 1 137 � , i. e. is typically two orders of magnitude weaker compared to Coulomb interactions. SOC-controlled electronic spin relaxation times of the order of hundreds of picoseconds to few nanoseconds are indeed observed in semiconductor quantum wells 27,31,32 and in bulk Ge 33 and graphene 34 . The long relaxation times result from the weakness of SOC compared to the Coulomb interaction that governs conventional charge relaxation, combined with the small density of conduction electrons.…”
Section: Temporal Dynamics Of Scatteringmentioning
confidence: 92%
“…SOC is a relativistic interaction that in atomic systems has a degree of smallness described by the fine structure constant, 𝛼𝛼 ≈ 1 137 � , i. e. is typically two orders of magnitude weaker compared to Coulomb interactions. SOC-controlled electronic spin relaxation times of the order of hundreds of picoseconds to few nanoseconds are indeed observed in semiconductor quantum wells 27,31,32 and in bulk Ge 33 and graphene 34 . The long relaxation times result from the weakness of SOC compared to the Coulomb interaction that governs conventional charge relaxation, combined with the small density of conduction electrons.…”
Section: Temporal Dynamics Of Scatteringmentioning
confidence: 92%
“…The large dielectric constant of STO substrate strongly screens the long-range Coulomb interactions inside 2D materials. This property has been already employed in experimental transport studies of graphene/STO heterostructure [34,38]. The angle-resolved spectroscopy of graphene on STO demonstrated the temperature-dependent nonlinearity of the energy spectrum, which can be attributed to the modulation of the electron-electron interaction as a function of temperature [36].…”
Section: Introductionmentioning
confidence: 94%
“…There is a growing interest in exploring the effect of substrate on the electronic and optical properties of 2D materials. Particularly, the heterostructure of STO substrate with graphene [34][35][36][37][38] and TMD [39,40] is attracting considerable attention. The large dielectric constant of STO substrate strongly screens the long-range Coulomb interactions inside 2D materials.…”
Section: Introductionmentioning
confidence: 99%
“…However, the use of such ultrahigh-k materials for gating remains currently limited to superconductors, where a STO gate 41 is used to control the carrier density in the LaAlO3/ SrTiO3 interface 42,43 and to 2D materials. 44,45 In this paper, we apply the ferroelectric gating to thin films of narrow band gap (HgTe and PbS) nanocrystals and demonstrate that this strategy leads to high capacitance gates which can be used in cryogenic condition (4-100 K). In a second step, we demonstrate that this gating strategy is compatible with plasmonic resonators and show a broad band enhanced absorption.…”
mentioning
confidence: 99%