Technology for obtaining of Niobium and Tantalum coatings on the copper Substrate

Abstract

The work is aimed at the development of technology for obtaining of coatings of refractory metals -Niobium and Tantalum on a Copper substrate, by evaporating the starting material with an electron beam and further condensation of a vapor stream. The macrostructure and the microstructure of the cross section, the phase composition of the coatings, obtained on the gradient substrate, and the degree of adhesion of the condensate to the substrate have been studied. The optimum temperature ranges of the substrate, which provide the best adhesion of coatings to a Copper substrate, are determined. For Niobium condensate it is 300-500°С, and for Tantalum condensate it is 600-750°С. The degree of mismatch between the crystal lattices of Copper, Niobium and Tantalum was calculated. Respectively it was concluded that the condensation temperature, structural and geometric factors of the substrate and condensed phases sufficiently affect the phase composition and degree of adhesion of the condensate to the substrate during the condensation of Niobium and Tantalum on the Copper substrate. Resume: