Abstract:A new generation of micromirror arrays (MMAs) with torsional actuators is being developed within the European research project MEMI in order to extend the usable spectral range of diffractive MMAs from deep ultraviolet into the visible and near infrared. The MMAs have 256 x 256 pixels reaching deflections above 350 nm at a frame rate of 1 kHz, which enables an operation in the target wavelength range between 240 nm and 800 nm. Customized driver electronics facilitates computer controlled operation and simple i… Show more
“…The MMA modulator consists of 65 536 torsion elements, monolithically integrated onto a CMOS backplane [6] (see Figure 2). The 256 x 256 actuator elements in the active area ensure a fill factor greater than 90 % with a pitch of 16 µm and 0.5 µm slit width.…”
Section: Analog Micromirror Arrays and Their Application As Programma...mentioning
confidence: 99%
“…The relative improvement certainly depends on the initial "non-calibrated" state, but the final state now is no more constrained by the spread of mirror deflections. The maximum MMA contrast becomes a function primarily of the single mirror deformation [8], which is guaranteed from the new MMA technology to locate in a very comfortable range well below λ/100 [6].…”
Section: Histogram Of Mirror Deflectionsmentioning
confidence: 99%
“…The main arguments are properties like real-time grayscale imaging at high-speed as well as high contrast operation within an extended wavelength range. Previously, some of these properties have been analyzed with focus on device technology and optical characterization [6], [7]. The present paper studies the steps, necessary to achieve the high contrast capabilities of a programmable, diffractive light modulator.…”
We report on our investigation to precisely actuate diffractive micromirror arrays (MMA) with an accuracy of /100. The test samples consist of analog, torsional MEMS arrays with 65 536 (256x256) mirror elements. These light modulators were developed for structured illumination purposes to be applied as programmable mask for life science and semiconductor microscopy application. Main part of the work relies on the well known characterization of MEMS mirrors with profilometry to automatically measure and approximate the MMA actuation state with high resolution. Examples illustrate the potential of this strategy to control the tilt state of many thousand micromirrors within the accuracy range of the characterization tool. In a dynamic range between 0 and >250 nm the MMA deflection has been precisely adjusted for final MMA application in the deep-UV - VIS - NIR spectral range. The optical properties of calibrated MMAs are tested in a laser measurement setup. After MMA calib ration an increased homogeneity and improved image contrast are demonstrated for various illumination patterns
“…The MMA modulator consists of 65 536 torsion elements, monolithically integrated onto a CMOS backplane [6] (see Figure 2). The 256 x 256 actuator elements in the active area ensure a fill factor greater than 90 % with a pitch of 16 µm and 0.5 µm slit width.…”
Section: Analog Micromirror Arrays and Their Application As Programma...mentioning
confidence: 99%
“…The relative improvement certainly depends on the initial "non-calibrated" state, but the final state now is no more constrained by the spread of mirror deflections. The maximum MMA contrast becomes a function primarily of the single mirror deformation [8], which is guaranteed from the new MMA technology to locate in a very comfortable range well below λ/100 [6].…”
Section: Histogram Of Mirror Deflectionsmentioning
confidence: 99%
“…The main arguments are properties like real-time grayscale imaging at high-speed as well as high contrast operation within an extended wavelength range. Previously, some of these properties have been analyzed with focus on device technology and optical characterization [6], [7]. The present paper studies the steps, necessary to achieve the high contrast capabilities of a programmable, diffractive light modulator.…”
We report on our investigation to precisely actuate diffractive micromirror arrays (MMA) with an accuracy of /100. The test samples consist of analog, torsional MEMS arrays with 65 536 (256x256) mirror elements. These light modulators were developed for structured illumination purposes to be applied as programmable mask for life science and semiconductor microscopy application. Main part of the work relies on the well known characterization of MEMS mirrors with profilometry to automatically measure and approximate the MMA actuation state with high resolution. Examples illustrate the potential of this strategy to control the tilt state of many thousand micromirrors within the accuracy range of the characterization tool. In a dynamic range between 0 and >250 nm the MMA deflection has been precisely adjusted for final MMA application in the deep-UV - VIS - NIR spectral range. The optical properties of calibrated MMAs are tested in a laser measurement setup. After MMA calib ration an increased homogeneity and improved image contrast are demonstrated for various illumination patterns
“…In order to meet this trend, from the developer's perspective two strategies are to be mentioned here: Firstly, the MEMS technology is continuously developed with process innovations, outlined in earlier publications [4]- [7]. Secondly, as complementary approach, the careful qualification and individual optimization of each single MEMS device may support highest optical performance.…”
Diffractive micromirror arrays (MMA) are a special class of optical MEMS, serving as spatial light modulators (SLM) that control the phase of reflected light. Since the surface profile is the determining factor for an accurate phase modulation, high-precision topographic characterization techniques are essential to reach highest optical performance. While optical profiling techniques such as white-light interferometry are still considered to be most suitable to this task, the practical limits of interferometric techniques start to become apparent with the current state of optical MEMS technology. Light scatter from structured surfaces carries information about their topography, making scatter techniques a promising alternative. Therefore, a spatially resolved scatter measurement technique, which takes advantage of the MMA’s diffractive principle, has been implemented experimentally. Spectral measurements show very high contrast ratios (up to 10 000 in selected samples), which are consistent with calculations from micromirror roughness parameters obtained by white-light interferometry, and demonstrate a high sensitivity to changes in the surface topography. The technique thus seems promising for the fast and highly sensitive characterization of diffractive MMAs
“…From an SLM developer's perspective, two strategic directions are pursued to efficiently achieve a high phase accuracy. On the one hand, the technology is continuously improved by process innovations [17][18][19] and, on the other hand, precise characterization techniques are developed to better understand and optimize the individual device performance through calibration [20,21]. Because the surface topography is the most important factor for the optical performance of an MMA, optical profiling techniques such as white-light interferometric (WLI) microscopy are classical candidates for a variety of MMA inspection, characterization, and optimization tasks.…”
Spatial light modulators (SLMs) support flexible system concepts in modern optics and especially phase-only SLMs such as micromirror arrays (MMAs) appear attractive for many applications. In order to achieve a precise phase modulation, which is crucial for optical performance, careful characterization and calibration of SLM devices is required. We examine an intensity-based measurement concept, which promises distinct advantages by means of a spatially resolved scatter measurement that is combined with the MMA's diffractive principle. Measurements yield quantitative results, which are consistent with measurements of micromirror roughness components, by white-light interferometry. They reveal relative scatter as low as 10-4, which corresponds to contrast ratios up to 10,000. The potential of the technique to resolve phase changes in the subnanometer range is experimentally demonstrated.
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