A considerable percentage of the increasing production plete and focused deposition but also an increased proof glass fibers for telecommunication is based on the duction rate. To investigate the conditions for optimal modified chemical vapor deposition (MCVD) process. performance, the governing partial differential equations The efficiency of this process is strongly hampered by were solved. By identifying the characteristic parameters the restricted and incomplete deposition of the expensive and their influence on the process, optimal design condibasic materials and the large taper effect. The introductions were found for specific combinations of those tion of an annular MCVD process yields not only comparameters.