TCAD modeling and simulation of self-limiting oxide growth and boron segregation during vertical silicon nanowire processing

Rossi, Chiara; Müller, Jonas; Pichler, Peter; Michałowski, Paweł Piotr; Larrieu, Guilhem

doi:10.1016/j.mssp.2024.108217

Materials Science in Semiconductor Processing

2024

DOI: 10.1016/j.mssp.2024.108217

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TCAD modeling and simulation of self-limiting oxide growth and boron segregation during vertical silicon nanowire processing

Chiara Rossi,

Jonas Müller,

Peter Pichler

et al.

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TCAD modeling and simulation of self-limiting oxide growth and boron segregation during vertical silicon nanowire processing

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References 33 publications

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