Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering

Depla, Diederik; Gryse, Roger De

doi:10.1016/j.surfcoat.2003.10.007

Cited by 74 publications

(30 citation statements)

References 7 publications

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“…3(d) has a dense columnar structure and less thickness than the other films, which is consistent with the decrease of the sputtering yield. The target surface was poisoned and the compound formation results in a decreased target erosion rate [45,46].…”

Section: Films Compositionmentioning

confidence: 99%

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Bouaouina

Besnard

Abaidia

et al. 2018

Surface and Coatings Technology

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is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. A B S T R A C TMolybdenum nitride thin films were deposited on (100) silicon substrates by R.F. magnetron sputtering of a Mo target in a (Ar-N 2 ) gas mixtures. The films were studied by Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS) and X-ray diffraction. The nanomechanical properties have been determined by nanoindentation and Peak-Force Quantitative Nanomechanical Mapping (PF-QNM). The total internal stresses were determined by curvature measurements and the Stoney formula. As thin film composition influences the morphology, the stress state and the mechanical properties, modifications are expected in this study where the nitrogen content is tuned. The film exhibits a polycrystalline structure with preferred orientation along (111) plane. The increase of the nitrogen content in the coating (N/ Mo = 1.1) induces a broadening of the full width at half maximum (FWHM) of the (111) diffraction peak, which is attributed to the presence of smaller crystallites. The residual stress and mechanical properties variation were correlated to the structural transition from γ-Mo 2 N to hexagonal and cubic MoN. The results show a good agreement between the nanomechanical properties obtained by nanoindentation and PF-QNM.

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Section: Films Compositionmentioning

confidence: 99%

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Bouaouina

Besnard

Abaidia

et al. 2018

Surface and Coatings Technology

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“…When a reactive gas, for example O 2 or N 2 , is introduced to the chamber it is likely to react with the target surface by chemisorption and reactive ion implantation, and with the sputtered target material at the substrate as well as with the chamber walls, forming a compound. [59,60] The compound film formation at the target surface is known as target poisoning. [61] The transition between the metallic and poisoned target surface conditions is often observed as sudden changes in the cathode voltage and current, gas pressure, and deposition rate.…”

Section: Reactive Hipimsmentioning

confidence: 99%

Silicon Oxynitride Thin Films Grown by Reactive HiPIMS

Hänninen¹

2015

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Amorphous silicon oxynitride (SiO x N y ) thin films were grown by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N 2 O plasmas. The elemental composition of the films was shown to depend on the target surface conditions during the film deposition, as well as on the reactive gas flow rate. When the target was sputtered under poisoned surface conditions, the film composition was predominantly silicon oxide, whereas films deposited in the transition regime between poisoned and metallic target surface conditions showed higher nitrogen concentrations, as measured by X-ray photoelectron spectroscopy (XPS) and elastic recoil detection analysis (ERDA). The different target surface conditions were identified based on the evolution of the target current waveforms upon variation of the deposition parameters. The average electron temperatures during the peak target current were determined by Langmuir probe measurements, to assist with the explanation of the observed target current behavior and target poisoning characteristics.The chemical composition of the films was shown to range from silicon-rich to effectively stoichiometric silicon oxynitrides, where no Si−Si contributions were found in the XPS Si 2p core level spectra. The film optical properties, the refractive index n and the extinction coefficient k, were shown to depend on the film chemical bonding, with the effectively stoichiometric films displaying optical properties falling between those of SiO 2 and Si 3 N 4 .iii iv Acknowledgments

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“…The introduction of HIPIMS in the coating deposition stage in reactive mode however requires careful consideration of the target poisoning effect. Target poisoning is an old problem in PVD technology and extensive research as well as progress has been achieved over the years in understanding, modelling and controlling the process [18,19,20]. However it is fair to say that the effects related to target poisoning in HIPIMS are still not very well studied and understood [21,22].…”

Section: Introductionmentioning

confidence: 99%

Structure evolution and properties of TiAlCN/VCN coatings deposited by reactive HIPIMS

Hovsepian

Ehiasarian

Petrov

2014

Surface and Coatings Technology

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Abstract:2.5 µm thick TiAlCN/VCN coatings were deposited by a reactive High Power Impulse Magnetron Sputtering (HIPIMS) process. Cross-sectional TEM showed gradual evolution of the structure of the coating with thickness. The initial structure is a nanoscale multilayer with sharp interlayer interfaces. This transforms to nanocomposite of TiAlCN and VCN nanocrystalline grains surrounded by a C-rich tissue phase and finally changes to an amorphous carbon rich Me-C phase. In contrast deposition in similar conditions using standard magnetron sputtering produces a well-defined nanoscale multilayer structure. Depth profiling by AES showed that the carbon content in the HIPIMS coating gradually increased from 25% at the coating substrate interface to 70% at the top thus supporting the TEM observations. Energy-resolved mass spectrometry revealed that HIPIMS plasma is a factor of 10 richer in C 1+ ions, and therefore more reactive, as compared to the plasma generated by standard magnetron discharge at the same conditions. The peculiar structure evolution in HIPIMS is discussed in relation to target poisoning effect and carbon outward diffusion during coating growth. 2Highly abrasive AlSi9Cu1 alloy was dry machined using TiAlCN/VCN coated 25 mm diameter end mills to investigate the coating-work piece material interaction. Green (532nm excitation) and ultraviolet (325 nm excitation) Raman spectroscopy was employed to identify the phase composition of the built up material on the cutting edge and chip (swarf) surfaces produced during machining. These analyses revealed formation of lubricious Magnèli phases namely V 2 O 5 and graphitic carbon as well as highly abrasive SiO 2 and mixed (AlSi)O thus shedding light on the wear processes and coating tribological behaviour during machining.

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Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering

Cited by 74 publications

References 7 publications

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive R.F. magnetron discharge

Silicon Oxynitride Thin Films Grown by Reactive HiPIMS

Structure evolution and properties of TiAlCN/VCN coatings deposited by reactive HIPIMS

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