Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media

Brombacher, Christoph; Saitner, Marc; Pfahler, Christian; Plettl, Alfred; Ziemann, P.; Makarov, Denys; Assmann, Daniel; Siekman, Martin Herman; Abelmann, Léon; Albrecht, Manfred

doi:10.1088/0957-4484/20/10/105304

Cited by 23 publications

(33 citation statements)

References 31 publications

(34 reference statements)

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“…Such linear relations between colloid diameter and etching time (for 200 nm particles a constant rate was found for even longer isotropic etching times than reported here [35] ) are in marked contrast to the corresponding highly non-linear behavior typically observed for both RIE etching and ion polishing of colloids. [28,36,37] It should be noted, however, that the magnitude of the etching rate is sensitive to thermal treatments of the colloids.…”

Section: Resultscontrasting

confidence: 88%

Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography

Plettl

Enderle

Saitner

et al. 2009

Adv Funct Materials

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145

163

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Hexagonally ordered arrays of non‐close‐packed nanoscaled spherical polystyrene (PS) particles are prepared exhibiting precisely controlled diameters and interparticle distances. For this purpose, a newly developed isotropic plasma etching process is applied to extended monolayers of PS colloids (starting diameters <300 nm) deposited onto hydrophilic silicon. Accurate size, shape, and smoothness control of such particles is accomplished by etching at low temperatures (−150 °C) with small rates not usually available in standard reactive ion etching equipment. The applicability of such PS arrays as masks for subsequent pattern transfer is demonstrated by fabricating arrays of cylindrical nanopores into Si.

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Section: Resultscontrasting

confidence: 88%

Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography

Plettl

Enderle

Saitner

et al. 2009

Adv Funct Materials

Self Cite

145

163

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“…Details can be found elsewhere [19,25]. The applied conditions resulted in typical etching rates of 6–8 nm/min maintaining both the spherical shape and the initial position of the PS particles.…”

Section: Resultsmentioning

confidence: 99%

“…The percolated magnetic films discussed below were deposited either by pulsed laser ablation (Fe films) or e-beam evaporation (Co/Pt multilayers). For preparation details see, e.g., [25–26]. Panels (c) and (d) in Fig.…”

Section: Resultsmentioning

confidence: 99%

“…Note that for such small nanostructures prepared from particles initially spaced at 180 nm the spherical shape is not maintained and rather semispheres are formed on the Si/SiO 2 substrate [25]. A [Co(0.3 nm)/Pt(0.8 nm)] 12 multilayer stack with an effective perpendicular magnetic anisotropy of 0.3 MJ/m 3 [31] has been deposited by alternating evaporation from pure Co and Pt sources by e-beam evaporation under ultrahigh vacuum conditions at ambient temperature.…”

Section: Resultsmentioning

confidence: 99%

“…A [Co(0.3 nm)/Pt(0.8 nm)] 12 multilayer stack with an effective perpendicular magnetic anisotropy of 0.3 MJ/m 3 [31] has been deposited by alternating evaporation from pure Co and Pt sources by e-beam evaporation under ultrahigh vacuum conditions at ambient temperature. For integral characterization polar magneto-optical Kerr effect (MOKE) magnetometry with a spot size of about 100 µm was used to investigate magnetic switching (details are given in reference [25]). For this sample, with structure sizes of 40 nm at a distance of 180 nm, the contribution of magnetic caps to the MOKE signal is small due to the reduced filling factor and the stronger scattering of the reflected laser beam off the particle caps.…”

Section: Resultsmentioning

confidence: 99%

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Tuning the properties of magnetic thin films by interaction with periodic nanostructures

Wiedwald¹,

Haering²,

Nau³

et al. 2012

Beilstein J. Nanotechnol.

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SummaryThe most important limitation for a significant increase of the areal storage density in magnetic recording is the superparamagnetic effect. Below a critical grain size of the used CoCrPt exchange-decoupled granular films the information cannot be stored for a reasonable time (typically ten years) due to thermal fluctuations arbitrary flipping of the magnetization direction. An alternative approach that may provide higher storage densities is the use of so-called percolated media, in which defect structures are imprinted in an exchange-coupled magnetic film. Such percolated magnetic films are investigated in the present work. We employ preparation routes that are based on (i) self-assembly of Au nanoparticles and (ii) homogeneous size-reduction of self-assembled polystyrene particles. On such non-close-packed nanostructures thin Fe films or Co/Pt multilayers are grown with in-plane and out-of-plane easy axis of magnetization. The impact of the particles on the magnetic switching behavior is measured by both integral magnetometry and magnetic microscopy techniques. We observe enhanced coercive fields while the switching field distribution is broadened compared to thin-film reference samples. It appears possible to tailor the magnetic domain sizes down to the width of an unperturbed domain wall in a continuous film, and moreover, we observe pinning and nucleation at or close to the imprinted defect structures.

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Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

et al. 2022

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Transparent conductive films (TCFs) are irreplaceable components in most optoelectronic applications such as solar cells, organic light‐emitting diodes, sensors, smart windows, and bioelectronics. The shortcomings of existing traditional transparent conductors demand the development of new material systems that are both transparent and electrically conductive, with variable functionality to meet the requirements of new generation optoelectronic devices. In this respect, TCFs with periodic or irregular nanomesh structures have recently emerged as promising candidates, which possess superior mechanical properties in comparison with conventional metal oxide TCFs. Among the methods for nanomesh TCFs fabrication, nanosphere lithography (NSL) has proven to be a versatile platform, with which a wide range of morphologically distinct nanomesh TCFs have been demonstrated. These materials are not only functionally diverse, but also have advantages in terms of device compatibility. This review provides a comprehensive description of the NSL process and its most relevant derivatives to fabricate nanomesh TCFs. The structure‐property relationships of these materials are elaborated and an overview of their application in different technologies across disciplines related to optoelectronics is given. It is concluded with a perspective on current shortcomings and future directions to further advance the field.

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Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media

Cited by 23 publications

References 31 publications

Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography

Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography

Tuning the properties of magnetic thin films by interaction with periodic nanostructures

Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

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