2015
DOI: 10.1002/smll.201500175
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Tailored Height Gradients in Vertical Nanowire Arrays via Mechanical and Electronic Modulation of Metal‐Assisted Chemical Etching

Abstract: In current top-down nanofabrication methodologies the design freedom is generally constrained to the two lateral dimensions, and is only limited by the resolution of the employed nanolithographic technique. However, nanostructure height, which relies on certain mask-dependent material deposition or etching techniques, is usually uniform, and on-chip variation of this parameter is difficult and generally limited to very simple patterns. Herein, a novel nanofabrication methodology is presented, which enables the… Show more

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Cited by 7 publications
(9 citation statements)
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“…We employ a recently developed fabrication method based on mechanically controlled metal-assisted chemical etching of silicon [23] to obtain ordered arrays of Si nanowires with height gradients. This fabrication method makes use of a thin gold layer comprising an array of nanoholes as catalyst to etch the silicon substrate.…”
Section: Communicationmentioning
confidence: 99%
See 4 more Smart Citations
“…We employ a recently developed fabrication method based on mechanically controlled metal-assisted chemical etching of silicon [23] to obtain ordered arrays of Si nanowires with height gradients. This fabrication method makes use of a thin gold layer comprising an array of nanoholes as catalyst to etch the silicon substrate.…”
Section: Communicationmentioning
confidence: 99%
“…This fabrication method makes use of a thin gold layer comprising an array of nanoholes as catalyst to etch the silicon substrate. [23] The Si nanowire metamirror concept is shown in Figure 1a, which displays a circular array of cylindrical nanowires with height gradients in the radial direction, i.e., the height of the nanowires increases toward the center of the array. The height gradients can be tuned by varying the stiffness of the catalytic metal mesh, i.e., by modifying the size and shape of the nanoholes array, the edge-to-edge separation distance between nanoholes, and the metal thickness.…”
Section: Communicationmentioning
confidence: 99%
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