2017
DOI: 10.1109/jmems.2017.2667582
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Tailored Etch Profiles for Wafer-Level Frequency Tuning of Axisymmetric Resonators

Abstract: Abstract-This paper reports a wafer-level technique for the systematic elimination of the modal frequency difference between a nominally degenerate pair of modes in an axisymmetric resonator design. A targeted etch process is developed in which masking resist and a conformal layer are ablated at specific sites on the resonator thereby exposing the underlying silicon and enabling site-specific mass removal by SiDRIE. A model of the perturbed resonator dynamics guides the selection of the ablation sites so that … Show more

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Cited by 37 publications
(29 citation statements)
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“…Although the phases of the Fourier components differ from one case to the other, the amplitude ratios are essentially constant and independent of the perturbation magnitude as shown in Ref. [8] where only the n ¼ 2 pair of modes is analyzed. An example of the mode shapes associated with the n ¼ 2, 3 pairs of modes is shown in Fig.…”
Section: Resonator Modelingmentioning
confidence: 82%
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“…Although the phases of the Fourier components differ from one case to the other, the amplitude ratios are essentially constant and independent of the perturbation magnitude as shown in Ref. [8] where only the n ¼ 2 pair of modes is analyzed. An example of the mode shapes associated with the n ¼ 2, 3 pairs of modes is shown in Fig.…”
Section: Resonator Modelingmentioning
confidence: 82%
“…This essential resonator design is also employed in Refs. [7] and [8]; however, there are differences in the way mass perturbations are achieved and, consequently, there are small changes to the top surface of the resonator to support one particular method or another. In this paper, a 1 lm thick, 130 lm diameter, gold film is deposited on the top surface of all 96 "large" spokes.…”
Section: Resonator Modelingmentioning
confidence: 99%
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