Abstract:Shipley Company supplies photoresist to the microelectronics industry for use in chip making. A design team developed a new photoresist using Taguchi experimental designs to describe the linear responses of key characteristics and linear programming to optimize the factors of formulation. We interchanged objective statements and property constraints when key properties were identified. This method of development allowed the design team to take the new photoresist, Megaposit S9400, from concept to marketplace i… Show more
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