The anisotropic dielectric functions (DF) of corundum structured m-plane α-(Al
x
Ga1-x
)2O3 thin films (up to x=0.76) grown on m-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) have been investigated. Infrared (IR) and visible-ultraviolet (UV) spectroscopic ellipsometry yields the DFs, while X-ray diffraction revealed the lattice parameters (a, m, c), showing the samples are almost fully relaxed. Analysis of the IR DFs from 250 cm-1 to 6000 cm−1 by a complex Lorentz oscillator model yields the anisotropic IR active phonons Eu
& A2u
and the shift towards higher wavenumbers with increasing Al content. Analyzing the UV DFs from 0.5 to 6.6 eV we find the change in the dielectric limits ε∞ and the shift of the Γ-point transition energies with increasing Al content. This results in anisotropic bowing parameters for α-(Al
x
Ga1-x
)2O3 of b
⊥=2.1 eV and b
∥=1.7 eV.